Advances in X-Ray Analysis: Volume 15
Editat de Charles Barretten Limba Engleză Paperback – 12 iun 2012
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Specificații
ISBN-13: 9781461399681
ISBN-10: 1461399688
Pagini: 588
Ilustrații: XII, 574 p. 225 illus.
Dimensiuni: 178 x 254 x 31 mm
Greutate: 1.01 kg
Ediția:1972
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
ISBN-10: 1461399688
Pagini: 588
Ilustrații: XII, 574 p. 225 illus.
Dimensiuni: 178 x 254 x 31 mm
Greutate: 1.01 kg
Ediția:1972
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
Public țintă
ResearchCuprins
The Application of High-Resolution Solid State Detectors to X-Ray Spectrometry — A Review.- Detection of Single Ions by Pulse Counting: Application to Ion Microprobe Mass Analyzer.- Application of Computers in Electron Probe and X-Ray Fluorescence Analysis.- Computer-Controlled X-Ray and Neutron Diffraction Experiments.- An Automated Two-Crystal Spectrometer Employing Direct Angular Positioning and Readout.- A Paper Tape Controlled X-Ray Diffractometer for the Measurement of Retained Austenite.- Automated X-Ray Diffraction Laboratory System.- X-Ray Diffraction Topography-Differential Omega Scanning Technique.- A Modular Automatic X-Ray Analysis System.- An Automated Electron Microprobe System.- Rapid Quantitative Analysis by X-Ray Spectrometry.- On the Method of Variable Take-Off Angle for Quantitative X-Ray Fluorescence Analysis (XRFA).- An Automatic X-Ray Analytical Instrument for the Chemical Laboratory.- Energy Dispersive Analysis for Adjacent Elements Using Two Single Channel Analyzers.- Determination of Zirconium, Hafnium, Niobium, Tantalum, Molybdenum and Tungsten in Aqueous Solutions by Radioisotopic Excited X-Ray Fluorescence.- Fluorescence Analysis Using an Si (Li) X-Ray Energy Analysis System with Low-Power X-Ray Tubes and Radioisotopes.- Rapid Recording of Powder Diffraction Patterns with Si(Li) X-Ray Energy Analysis System: W and Cu Targets and Error Analysis.- A Complete Instrumental System for Energy Dispersive Diffractometry and Fluorescence Analysis.- Small X-Ray Tubes for Energy Dispersive Analysis Using Semiconductor Spectrometers.- Rapid Analysis of Mn in Plain Carbon Steels by Nondispersive X-Ray Fluorescence Spectroscopy.- The Use of Field Emission Tubes in X-Ray Analysis.- Old Errors and New Corrections in X-Ray Line Profile Analysis.- TheEffects of Self-Irradiation on the Lattice of 238(80%)PuO2.- The Disorder-Order Transformation in Ni4Mo.- A Strategy for Rapid and Accurate (p.p.m.) Measurement of Lattice Parameters of Single Crystals by Bond’s Method.- X-Ray Spectral Distributions from Thick Tungsten Targets in the Energy Range 12 to 300 kV.- Elemental X-Ray Cross Sections at Selected Wavelengths.- A Computerized Technique of Plotting a Complete Pole Figure by an X-Ray Reflection Method.- Proton-Induced X-Ray Emission Spectroscopy in Elemental Trace Analysis.- Use of a Solid-State Detector for the Analysis of X-Rays Excited in Silicate Rocks by Alpha-Particle Bombardment.- Studies of X Rays Induced by Charged Particles.- Evaluation of X-Ray Image Intensifiers as Detectors for X-Ray Astronomy.- An Electro-Optical X-Ray Diffraction System for Grain Boundary Migration Measurements at Temperature.- Proposed Flash X-Ray System for X-Ray Diffraction with Submicrosecond Exposure Time.- Analysis of Solid Surfaces by Soft X-Ray Appearance Potential Spectroscopy.- Detector Background and Sensitivity of Semiconductor X-Ray Fluorescence Spectrometers.- The Measurement of Surface-Layer Stresses in a Polycrystalline Glass by Means of X-Ray Diffraction.- The Determination of the Axis of Lattice Rotation with Respect to a Change in Texture.- Simultaneous Spiral Recording of Pole Figures on Polaroid Film for Texture Goniometers.- X-Ray Double Crystal Diffractometer Investigations of Implanted Silicon: D+ and N+.- X-Ray Investigations of Spinel Substrates.- Cross Linking of Collagen by Hydrophobe Bonds.- Effect of Ion Exchange Resin Particle Size on X-Ray Fluorescent Analysis.- On-Line Process Control Compositional Analysis of Aluminum Films Containing a Low Percentage of Copper.- Flame Technique for HighTemperature Single Crystal Weissenberg Photography (1000–3000°C).