Amorphous and Crystalline Silicon Carbide II: Recent Developments Proceedings of the 2nd International Conference, Santa Clara, CA, December 15—16, 1988: Springer Proceedings in Physics, cartea 43
Editat de Mahmud M. Rahman, Cary Y. -W. Yang, Gary L. Harrisen Limba Engleză Paperback – 23 noi 2011
Din seria Springer Proceedings in Physics
- Preț: 426.72 lei
- 18% Preț: 1007.35 lei
- 18% Preț: 1875.48 lei
- 18% Preț: 1268.55 lei
- 15% Preț: 641.71 lei
- 18% Preț: 1408.26 lei
- 18% Preț: 1397.19 lei
- 18% Preț: 948.16 lei
- 18% Preț: 1106.00 lei
- Preț: 298.48 lei
- 18% Preț: 1682.11 lei
- 18% Preț: 1233.06 lei
- 18% Preț: 1000.24 lei
- 18% Preț: 1122.56 lei
- 18% Preț: 1121.76 lei
- 18% Preț: 1120.18 lei
- 18% Preț: 1006.55 lei
- 18% Preț: 1121.76 lei
- 18% Preț: 1014.45 lei
- 18% Preț: 1010.48 lei
- 23% Preț: 650.15 lei
- 15% Preț: 642.03 lei
- 15% Preț: 640.37 lei
- 18% Preț: 1834.27 lei
- 18% Preț: 1220.26 lei
- 18% Preț: 1827.80 lei
- 18% Preț: 1222.80 lei
- 18% Preț: 1228.96 lei
- 18% Preț: 1217.41 lei
- 18% Preț: 1835.07 lei
- 18% Preț: 1235.25 lei
- 24% Preț: 881.65 lei
- 18% Preț: 952.09 lei
- 15% Preț: 639.73 lei
- 18% Preț: 1227.36 lei
- 18% Preț: 1568.47 lei
- 18% Preț: 1830.97 lei
Preț: 639.73 lei
Preț vechi: 752.63 lei
-15% Nou
Puncte Express: 960
Preț estimativ în valută:
122.42€ • 128.40$ • 101.91£
122.42€ • 128.40$ • 101.91£
Carte tipărită la comandă
Livrare economică 01-15 aprilie
Preluare comenzi: 021 569.72.76
Specificații
ISBN-13: 9783642750502
ISBN-10: 3642750508
Pagini: 248
Ilustrații: X, 232 p.
Dimensiuni: 170 x 242 x 13 mm
Greutate: 0.4 kg
Ediția:Softcover reprint of the original 1st ed. 1989
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Proceedings in Physics
Locul publicării:Berlin, Heidelberg, Germany
ISBN-10: 3642750508
Pagini: 248
Ilustrații: X, 232 p.
Dimensiuni: 170 x 242 x 13 mm
Greutate: 0.4 kg
Ediția:Softcover reprint of the original 1st ed. 1989
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Proceedings in Physics
Locul publicării:Berlin, Heidelberg, Germany
Public țintă
ResearchCuprins
I Growth of Crystalline Silicon Carbide.- Crystalline SiC on Si and High Temperature Operational Devices (With 7 Figures).- Heteroepitaxial Growth of Cubic SiC on a Si Substrate Using the Si2H6-C2H2-H2 System (With 6 Figures).- Chemical Vapor Deposition of Single Crystal ?-SiC (With 4 Figures).- ?-Silicon Carbide Prepared by Rapid Thermal Chemical Vapor Deposition (With 4 Figures).- Single Crystal Growth of 6H-SiC by a Vacuum Sublimation Method, and Blue LEDs (With 17 Figures).- Polytype Change of Silicon Carbide at High Temperatures (With 3 Figures).- Epitaxial Growth of (SiC)xGe1-x on Silicon Substrates (With 1 Figure).- One-Dimensional Fluid Mechanics/Kinetics Modeling of the CVD of SiC in a Vertical Reactor.- II Growth of Amorphous, Microcrystalline, and Polycrystalline Silicon Carbide.- Properties of a-SiC:H Films Prepared with a Field-Enhanced RF Glow-Discharge System (With 4 Figures).- Preparation of Microcrystalline Silicon Carbide Thin Films for the Emitter of Si HBTs (With 4 Figures).- High-Quality Microcrystalline SiC Films Fabricated by the Controlled Plasma Magnetron Method (With 10 Figures).- Electron-Cyclotron-Resonance Plasma Deposition of Carbon onto Silicon (With 8 Figures).- Preparation and Characterization of Amorphous SiC Film by a Liquid Route (With 2 Figures).- III Characterization of Silicon Carbide.- Gap States of Highly Photosensitive a-SiC:H (With 5 Figures).- X-Ray Photoelectron Spectroscopy Study of Hydrogenated Amorphous Silicon Carbide Films (With 4 Figures).- Doping-Induced Structural Change in Amorphous Silicon (Carbon) Hydrogen Alloy (With 6 Figures).- Small Angle X-Ray Scattering from Microvoids in the a-SiC:H Alloy (With 3 Figures).- Studies on Carrier Lifetime and Deep Levels in CVD-Grown 3C-SiC by Photoconductivity and MicrowaveAbsorption (With 8 Figures).- ESR Study of Defects in Epitaxially Grown 3C-SiC (With 4 Figures).- Time-Resolved Photoluminescence Studies of Undoped and Al-Doped Cubic SiC (With 3 Figures).- Photoluminescence Imaging of Spatial Distribution of Recombination Centers in Cubic SiC (With 3 Figures).- Stress-Induced Defects vs Growth Faults in CVD-Grown SiC.- Crystalline Defects in ?-SiC as Revealed by a NaOH-KOH Eutectic Etch (With 6 Figures).- Ellipsometric Study of Cubic SiC.- Photoluminescence and Transmission Electron Microscopy of Defects in SiC Grown on Si.- Vibrational and Electrical Properties of n and p Doped a-SiC:H Films.- IV Growth and Applications of Diamond Thin Films.- Current Status of Diamond Thin Films.- New Material and Device Design Considerations for High-Power Electronics.- Active and Passive Electronic Applications of CVD Diamond Films.- V Surfaces and Interfaces of Silicon Carbide.- Surface and Interface Studies of SiC (Buffer-Layer)/Si(100) (With 6 Figures).- The Influence of Hydrogen on the Transition from Amorphous to Crystalline Structure in Plasma Deposition of Silicon and Alloys.- Microstructure of the a-Si1-xCx:H/c-Si Interface (With 2 Figures).- Atomic Layer Control in Cubic SiC Growth Utilizing Surface Superstructure in Gas Source MBE (With 7 Figures).- On the Stability of a Cr + C Phase on (100) 3C SiC at Elevated Temperatures.- VI Processing and Device Applications of Silicon Carbide.- Physics and Applications of Amorphous Silicon Carbide (With 6 Figures).- ?-SiC on Titanium Carbide for Solid State Devices (With 12 Figures).- Fabrication of MOSFETs on ?-SiC Single Crystalline Layers Grown on Si(100) Substrates (With 6 Figures).- A High Transconductance ?-SiC Buried-Gate Junction Field Effect Transistor (With 5 Figures).- SiC as aPotential FET Gate Insulator (With 8 Figures).- Applications of High Purity SiC Prepared by Chemical Vapor Deposition (With 12 Figures).- SiC/Si HBT Using Polycrystalline SiC Layers Prepared by Electron Beam Evaporation (With 5 Figures).- Thin Film Transistors Using Polycrystalline SiC (With 8 Figures).- Mechanisms in Reactive Ion Etching of Silicon Carbide Thin Films (With 6 Figures).- W/SiC Contact Resistance at Elevated Temperatures (With 2 Figures).- Application of Excimer Laser Processing in SiC Device Fabrication.- Index of Contributors.