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Chemical Vapor Deposition

Editat de S. Neralla
en Limba Engleză Hardback – 30 aug 2016
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
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Specificații

ISBN-13: 9789535125723
ISBN-10: 9535125729
Pagini: 290
Dimensiuni: 185 x 266 x 25 mm
Greutate: 0.66 kg
Editura: IntechOpen