Chemistry and Lithography: SPIE Press Monograph
Autor Uzodinma Okoroanyanwuen Limba Engleză Hardback – 14 apr 2010
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Specificații
ISBN-13: 9780819475626
ISBN-10: 0819475629
Pagini: 900
Dimensiuni: 181 x 258 x 57 mm
Greutate: 1.95 kg
Editura: SPIE
Seria SPIE Press Monograph
ISBN-10: 0819475629
Pagini: 900
Dimensiuni: 181 x 258 x 57 mm
Greutate: 1.95 kg
Editura: SPIE
Seria SPIE Press Monograph
Cuprins
Introduction; Invention of Lithography and Photolithography; Chemical and Optical Origins of Lithography; Evolution of Lithography; Lithographic Chemicals and Materials; Negative Resists; Positive Resists; General Considerations on the Radiation and Photochemistry of Resists; Anti-Reflection Coatings; Stone, Plate and Offset Lithography; The Semiconductor Lithographic Process; Lithographic Modeling; Optical Lithography; Charged Particle Lithography; Implementation of Lithography in Integrated Circuit Device Fabrication; Advanced Lithographic Processing.