Growth of Nano-Structured Thin Films of Magnetic Materials: An Illustration

This project is aimed to deposit magnetic thin films by Pulsed Laser Deposition (PLD) technique. A KrF Excimer laser (248 nm, 20 ns) operated at 20 Hz was used as an energy source for the deposition. Films are deposited under various deposition conditions, like substrate temperature, oxygen pressure, post annealing and applied external magnetic field depending upon the target material characteristics. On the basis of the structure the deposited films are classified as cubic spinel ferrites (NiFe2O4 and ZnMnZrFeO), Hexaferrite (BaFe12O19) and Alloy (NdFeCo).