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Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology

Autor Peter M. Martin
en Limba Engleză Hardback – 30 noi 2009
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
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Specificații

ISBN-13: 9780815520313
ISBN-10: 081552031X
Pagini: 936
Dimensiuni: 191 x 235 x 41 mm
Greutate: 1.72 kg
Ediția:3
Editura: ELSEVIER SCIENCE
Locul publicării:United States

Public țintă

Engineers, technicians, and plant personnel in the semiconductor and related industries. All institutions that are involved with thin film coating technology, including industry, government and national laboratories, colleges and universities.

Cuprins

1. Deposition Technologies: An Overview2. Plasmas in Deposition Processes3. Surface Preparation for Film and Coating Deposition Processes4. Evaporation: Processes, Bulk Microstructures and Mechanical Properties5. Sputter Deposition Processes6. Ion Plating7. Chemical Vapor Deposition8. Atomic Layer Deposition9. Plasma-Enhanced Chemical Vapor Deposition of Functional Coatings10. Unfiltered and Filtered Cathodic Arc Processes11. Vacuum Polymer Deposition12. Thin Film Nucleation, Growth, and Microstructural Evolution: An Atomic Scale View13. Glancing Angle Deposition14. Nanocomposite Coatings for Severe Applications15. Non-Elemental Characterization of Films and Coatings16. Characterization of Films and Coatings17. Atmospheric Pressure Plasma Sources and Processing18. Jet Vapor Deposition