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Laser-Induced Plasmas

Editat de Ethan J. Hemsworth
en Limba Engleză Hardback – 11 ian 2012
This book examines the theory and applications of laser-induced plasmas. Topics discussed include the application of laser-induced plasma expansion models for thin film deposition; cluster-containing plasma fumes for high-order harmonic generation laser radiation; pulsed laser deposition of nanocrystalline V2O5 thin films; nanosecond and femtosecond laser ablation of TeO2 crystals; resonant harmonic generation of short pulse laser in plasma and the influence of the heterogeneous nature of laser ablation on near-surface plasma formation and propagation.
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Specificații

ISBN-13: 9781613248515
ISBN-10: 1613248512
Pagini: 312
Ilustrații: Illustrations
Dimensiuni: 263 x 185 x 23 mm
Greutate: 0.77 kg
Editura: Nova Science Publishers Inc

Cuprins

Preface; Practical Application of Laser-Induced Plasma Expansion Models for Thin Film Deposition; Cluster-Containing Plasma Plumes: The Attractive Media for High-Order Harmonic Generation of Laser Radiation; Pulsed Laser Deposition of V2O5 & Time-of-Flight Analysis of the Laser-Induced Plasma; Nanosecond & Femtosecond Laser Ablation of TeO2 Crystals: Surface Characterization & Plasma Analysis; Influence of Heterogeneous Nature of Laser Ablation on Near-Surface Plasma Formation & Propagation; Parametric Instabilities of Ultraintense Laser Pulses Propagating in Plasmas; Processes in Atomic Plasma under Resonant Laser Light; Surface Analysis by LIPS Mapping & Depth-Profiling; Prospectives of Laser-Induced Breakdown Spectrometry: More Sensitive, Precise & Flexible Analysis; Advanced CO2 Laser-Induced Plasma Processing & its Application; Laser Ablation & Laser Desorption Coupled to Mass Spectrometry; Spectroscopic Analysis & Temporal Evolution of Laser-Induced Plasma in Different Samples.