Materials Science of Thin Films: Deposition and Structure, Third Edition, carries on the tradition of this intriguing series, offering the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. . The authors' engaging style brings new coverage to a variety of important topics within the field, including the latest, and most important, deposition techniques, atomic layer deposition and high impulse magnetron sputtering, and new, or expanded, coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth.