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Microelectronic Applications of Chemical Mechanical Planarization de Y. Li

Microelectronic Applications of Chemical Mechanical Planarization

Autor Y. Li
en Limba Engleză Hardback – 12 noi 2007
This book provides systematic and comprehensive description about the current state of CMP technology. It includes the important fundamentals and basic science as well, making the book fit as an introduction to CMP newcomers and a valuable reference source for professionals.
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Specificații

ISBN-13: 9780471719199
ISBN-10: 0471719196
Pagini: 760
Dimensiuni: 156 x 234 x 42 mm
Greutate: 1.19 kg
Editura: Wiley
Locul publicării:Hoboken, United States

Public țintă

Professionals working with CMP, including: process engineers, equipment engineers, formulation chemists, product mangers, marketing managers, tool and material suppliers, and IC manufacturers. Students of advanced graduate courses for CMP or related semiconductor manufacturing processes. Those who are new to the field with a related physical science or engineering background can use the book as a training manual. Professionals in related fields or who periodically deal with CMP issues (ie, facilities managers in water treatment plants) can use this book to become familiar with the terminology and concepts of CMP. Academic and industrial research institutes.

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