Modern Ion Plating Technology: Fundamentals and Applications
Autor Fuzhen Wang, Junwei Wuen Limba Engleză Paperback – 29 sep 2022
- Presents both the principle and processes of various ion plating technology
- Introduces the fundamental physics of ion plating
- Includes the application of ion plating technology in high-tech products
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Specificații
ISBN-13: 9780323908337
ISBN-10: 0323908330
Pagini: 550
Ilustrații: 400 illustrations (150 in full color)
Dimensiuni: 191 x 235 mm
Greutate: 0.94 kg
Editura: ELSEVIER SCIENCE
ISBN-10: 0323908330
Pagini: 550
Ilustrații: 400 illustrations (150 in full color)
Dimensiuni: 191 x 235 mm
Greutate: 0.94 kg
Editura: ELSEVIER SCIENCE
Public țintă
Materials Scientists and Engineers, Post-gradStudents. Chemists
Cuprins
1. Introduction of Ion Plating Technology
2. Fundamental of Vacuum Physics
3. Fundamental of Plasma Physics
4. Classification of Vacuum Plating Technology
5. Vacuum Evaporation Plating
6. Glow discharge Ion plating
7. 7 Hot Arc Ion Plating
8. Cathodic Arc Ion Plating
9. Magnetron Sputtering Technology
10. Plasma chemical vapor deposition (CVD)
11. Function of Charged Particle Beams in Plating
12. Application of Ion Plating
2. Fundamental of Vacuum Physics
3. Fundamental of Plasma Physics
4. Classification of Vacuum Plating Technology
5. Vacuum Evaporation Plating
6. Glow discharge Ion plating
7. 7 Hot Arc Ion Plating
8. Cathodic Arc Ion Plating
9. Magnetron Sputtering Technology
10. Plasma chemical vapor deposition (CVD)
11. Function of Charged Particle Beams in Plating
12. Application of Ion Plating