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Modern Ion Plating Technology: Fundamentals and Applications

Autor Fuzhen Wang, Junwei Wu
en Limba Engleză Paperback – 29 sep 2022
Modern Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems.

  • Presents both the principle and processes of various ion plating technology
  • Introduces the fundamental physics of ion plating
  • Includes the application of ion plating technology in high-tech products
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Specificații

ISBN-13: 9780323908337
ISBN-10: 0323908330
Pagini: 550
Ilustrații: 400 illustrations (150 in full color)
Dimensiuni: 191 x 235 mm
Greutate: 0.94 kg
Editura: ELSEVIER SCIENCE

Public țintă

Materials Scientists and Engineers, Post-grad
Students. Chemists

Cuprins

1. Introduction of Ion Plating Technology
2. Fundamental of Vacuum Physics
3. Fundamental of Plasma Physics
4. Classification of Vacuum Plating Technology
5. Vacuum Evaporation Plating
6. Glow discharge Ion plating
7. 7 Hot Arc Ion Plating
8. Cathodic Arc Ion Plating
9. Magnetron Sputtering Technology
10. Plasma chemical vapor deposition (CVD)
11. Function of Charged Particle Beams in Plating
12. Application of Ion Plating