Nanoscale CMOS VLSI Circuits: Design for Manufacturability
Autor Sandip Kundu, Aswin Sreedharen Limba Engleză Hardback – 16 aug 2010
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Cutting-Edge CMOS VLSI Design for Manufacturability Techniques
This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource.Nanoscale CMOS VLSI Circuits covers:
- Current trends in CMOS VLSI design
- Semiconductor manufacturing technologies
- Photolithography
- Process and device variability: analyses and modeling
- Manufacturing-Aware Physical Design Closure
- Metrology, manufacturing defects, and defect extraction
- Defect impact modeling and yield improvement techniques
- Physical design and reliability
- DFM tools and methodologies
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Specificații
ISBN-13: 9780071635196
ISBN-10: 007163519X
Pagini: 316
Dimensiuni: 160 x 236 x 25 mm
Greutate: 0.6 kg
Editura: McGraw Hill Education
Colecția McGraw-Hill
Locul publicării:United States
ISBN-10: 007163519X
Pagini: 316
Dimensiuni: 160 x 236 x 25 mm
Greutate: 0.6 kg
Editura: McGraw Hill Education
Colecția McGraw-Hill
Locul publicării:United States
Cuprins
Chapter 1. Introduction; Chapter 2. Semiconductor Manufacturing; Chapter 3. Process and Device Variability: Analysis and Modeling; Chapter 4. Manufacturing-Aware Physical Design Closure; Chapter 5. Metrology, Manufacturing Defects, and Defect Extraction; Chapter 6. Defect Impact Modeling and Yield Improvement Techniques; Chapter 7. Physical Design and Reliability; Chapter 8. Design for Manufacturability: Tools and Methodologies