Nanostructured Thin Film Deposition by Sputtering: From Fundamentals to Applications provides an exhaustive overview of the significant influence of sputtering in the production of nanostructured thin films. It begins with a review of the historical evolution and fundamental principles inherent to sputtering before delving into a thorough examination of thin films, covering their distinctive properties, the impact of sputtering, and the role of target materials. Building upon this base, the book unveils advanced sputtering methodologies, augmented with applicable case studies. The book provides an in-depth study of nanostructured thin films, addressing their diverse forms, and the elaborate procedures for nanostructure characterization. Finally, it embarks on an extensive analysis of the broad range of applications of sputtered nanostructured thin films, with a focus on sectors such as electronics, optics, biomedicine, and environmental science, as well as promising domains like automotive, oil and gas, food, and energy sectors. This approach offers a sweeping view of sputtering, bridging basic concepts and sophisticated aspects, thereby crafting an invaluable compendium for both researchers and learners in the field.

• Covers the latest advances and applications of sputtering for depositing nanostructured thin films
• Emphasizes the importance of plasma diagnostics, materials characterization, and surface engineering in the field of thin film technology
• Includes practical examples and case studies that illustrate the potential of sputtered nanostructured thin films for a wide range of industries and applications