Particles on Surfaces: Detection, Adhesion and Removal, Volume 8
Editat de Kash L. Mittalen Limba Engleză Hardback – dec 2003
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Specificații
ISBN-13: 9789067643924
ISBN-10: 9067643920
Pagini: 352
Dimensiuni: 156 x 234 x 20 mm
Greutate: 0.75 kg
Ediția:1
Editura: CRC Press
Colecția CRC Press
ISBN-10: 9067643920
Pagini: 352
Dimensiuni: 156 x 234 x 20 mm
Greutate: 0.75 kg
Ediția:1
Editura: CRC Press
Colecția CRC Press
Cuprins
Preface; Part 1: Particle Analysis / Characterization and General Cleaning-Related Topics; The nature and characterization of small particles; Surface and micro-analytical methods for particle identification; The haze of a wafer: A new approach to monitor nano-sized Particles; Particle transport and adhesion in an ultra-clean ion-beam sputter deposition process; Particle deposition from a carry-over layer during immersion Rinsing; The use of surfactants to reduce particulate contamination on surfaces; The use of rectangular jets for surface decontamination; Ice-air blast cleaning: Case studies; Development of a technique for glass cleaning in the course of demanufacturing of electronic products; Part 2: Particle Adhesion and Removal Mechanics of nanoparticle adhesion — A continuum approach; A new thermodynamic theory of adhesion of particles on surfaces; Particle adhesion on nanoscale rough surfaces; Advanced wet cleaning of sub-micrometer sized particles; Modified SC-1 solutions for silicon wafer cleaning; Investigation of ozonated DI water in semiconductor wafer Cleaning; Possible post-CMP cleaning processes for STI ceria slurries; The ideal ultrasonic parameters for delicate parts cleaning; Effects of megasonics coupled with SC-1 process parameters on particle removal on 300-mm silicon wafers; Influences of various parameters on microparticles removal during laser surface cleaning; Particle removal with pulsed-laser induced plasma over an extended area of a silicon wafer; Particle removal by collisions with energetic clusters
Descriere
This volume documents the proceedings of the 8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Providence, Rhode Island, June 24–26, 2002