Physical Vapor Deposition of Thin Films
Autor JE Mahanen Limba Engleză Hardback – 7 feb 2000
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Specificații
ISBN-13: 9780471330011
ISBN-10: 0471330019
Pagini: 336
Dimensiuni: 164 x 243 x 24 mm
Greutate: 0.61 kg
Ediția:New.
Editura: Wiley
Locul publicării:Hoboken, United States
ISBN-10: 0471330019
Pagini: 336
Dimensiuni: 164 x 243 x 24 mm
Greutate: 0.61 kg
Ediția:New.
Editura: Wiley
Locul publicării:Hoboken, United States
Public țintă
Upper level Undergraduate and early Graduate courses in Electrical Engineering. This is not a required course but it is taught widely as part of the broader thin films courses dealing with integrated circuit or microdevice fabrication, and optical thin film structures. It is required for Engineers planning to work in the semiconductor device and optical technology areas. The book will be a useful reference for Practicing Engineers, particularly those entering the semiconductor manufacturing industry.Cuprins
Descriere
This volume examines physical vapour deposition, one of the main methods for preparing thin films for integrated circuit manufacturing and many other high-tech industries. It introduces unified treatment of the field of physical vapour deposition, drawing on a wide range of physical science.