Physics and Chemistry of III-V Compound Semiconductor Interfaces
Editat de Carl Wilmsenen Limba Engleză Paperback – 22 mar 2012
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Specificații
ISBN-13: 9781468448375
ISBN-10: 1468448374
Pagini: 484
Ilustrații: XIII, 465 p.
Dimensiuni: 152 x 229 x 25 mm
Greutate: 0.64 kg
Ediția:Softcover reprint of the original 1st ed. 1985
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
ISBN-10: 1468448374
Pagini: 484
Ilustrații: XIII, 465 p.
Dimensiuni: 152 x 229 x 25 mm
Greutate: 0.64 kg
Ediția:Softcover reprint of the original 1st ed. 1985
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
Public țintă
ResearchCuprins
1. III-V Semiconductor Surface Interactions.- 1. Introduction.- 2. Interface States and Schottky Barriers.- 3. Clean Surfaces of III-V Semiconductors.- 4. Adsorption of Gases on Clean III-V Semiconductors.- 5. Metal Films on Clean III-V Surfaces.- 6. The Electrical Nature of Intimate Interfaces.- 7. Conclusions.- References.- 2. Schottky Diodes and Ohmic Contacts for the III-V Semiconductors.- 1. Introduction.- 2. Electrical Properties of Metal-Semiconductor Contacts.- 3. Schottky-Diode Technology.- 4. Ohmic-Contact Technology.- References.- 3. The Deposited Insulator/III-V Semiconductor Interface.- 1. Introduction.- 2. General Overview of the Deposited Insulator/III-V Interface.- 3. Choice of Insulator and Deposition Technique.- 4. Interfacial Properties.- 5. Experimental Results.- 6. Concluding Remarks.- References.- 4. Electrical Properties of Insulator-Semiconductor Interfaces on III-V Compounds.- 1. Introduction.- 2. Theoretical Background.- 3. Gallium Arsenide.- 4. Indium Antimonide.- 5. Indium Phosphide.- 6. Indium Arsenide.- 7. Gallium Phosphide.- 8. Gallium Arsenide Phosphide.- 9. Whither Surface States.- 10. Low-Temperature Deposition of Dielectric Layers.- 11. Conclusion.- References.- 5. III-V Inversion-Layer Transport.- 1. Introduction.- 2. Quantization.- 3. Surface Scattering Mechanisms.- 4. Phonon Scattering.- 5. Experimental Results.- Summary.- References.- 6. Interfacial Constraints on III-V Compounds MIS Devices.- 1. Introduction.- 2. Dielectric-Semiconductor Interfacial Phenomena.- 3. MIS-Device Characteristics.- 4. Device Results.- 5. Epilogue.- References.- 7. Oxide/III-V Compound Semiconductor Interfaces.- 1. Introduction.- 2. The Chemically Cleaned Surface.- 3. Thermal Oxides.- 4. Anodic Oxides.- 5. Plasma-Grown Oxide.- References.