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Radio-Frequency Capacitive Discharges de Yuri P. Raizer

Radio-Frequency Capacitive Discharges

Autor Yuri P. Raizer, Mikhail N. Shneider, Nikolai A. Yatsenko
en Limba Engleză Paperback – 27 sep 2019
The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings.

Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.
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Specificații

ISBN-13: 9780367401863
ISBN-10: 036740186X
Pagini: 304
Dimensiuni: 152 x 229 mm
Greutate: 0.45 kg
Ediția:1
Editura: CRC Press
Colecția CRC Press

Public țintă

Academic and Professional Practice & Development

Cuprins

Basic Principals of the RF Capacitive Discharge Excitation of an RF Discharge Electron Motion in an Oscillating Electric Field Electrodynamic Plasma Characteristics and Interaction with Oscillating Field Electron Production and Loss: Plasma Maintenance A Simplified Model of the RF Discharge Constant Positive Plasma Potential Stochastic Heating of Electrons RF Discharge Modes Moderate-Pressure RF Discharge Space Charge Sheaths Experimental Current-Voltage Characteristics CVC and Normal Current Densities in the a-Discharge (Theory and Numerical Simulation) The a-g Transition Parameters The y-Discharge The a-g Transition at Moderate and Low Pressures Coexistence of Two RF Modes in the Gap High-Pressure RF Capacitive Discharges RF Discharge with Coated Electrodes Low-Pressure RF Discharges and Asymmetry Effects Self-Bias in an Asymmetric Capacitively Coupled Discharge Correlations Between Plasma and Sheath Parameters in an Ambipolar Diffusion-Controlled Discharge Sheath Dynamics and Current Anharmonicity in an Asymmetric Discharge Current Anharmonicity in Asymmetric and Symmetric Discharges Battery Effect in an Asymmetric Discharge Plasma 'Nontransparency' and Fast Electron Response to RF Field and 'Oscillationless' Sheath Ions The Floating Potential The a-Sheath The Energy Spectrum of Ions Bombarding the Electrode Surface RF Discharge in Electronegative Gases Smooth a-g Transition and the g Mode Some Aspects of Stochastic Heating of Electrons Numerical Simulation of Low-Pressure RF Discharges Magnetron RF Discharge Experimental Methods and Measurements Voltage Measurements and Current-Voltage Characteristics Probe Measurement of Constant Space and Plasma Potentials Active DC Probing of an RF Discharge A Method for Studying the Transverse Discharge Structure Optical Methods for the Study of Spatial Discharge Structure Laser-Induced Fluorescence and Laser-Optogalvanic Spectroscopy Excitation and Control of an RF Discharge Application of RF Capacitive Discharges for Gas Laser Excitation and Plasma Technology RF Discharge and Gas Lasers: A Brief History Arguments in Favor of RF Laser Excitation Frequency Dependence of Discharge and Active Laser Medium Parameters Selection of Designs and Parameters of Transverse RF-Excited CO2 Lasers with Diffusional Cooling Optical Resonators of Waveguide and Slab RF CO2 Lasers High Flowrate CO2 Lasers Excited by RF and Combined RF-DC Discharges Lasers with Alternative Active Media Magnetic Stabilization of Slab Discharges Plasmachemical Technology References Index

Notă biografică

Raizer, Yuri P.; Shneider, Mikhail N.; Yatsenko, Nikolai A.

Descriere

Written by well-known specialists in the field, Radio-Frequency Capacitive Discharges systematically describes radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. It provides a comprehensive treatment of the physics underlying rf discharges, techniques for generating such discharges, experimental methods and measurement techniques, and numerous recent research results. The authors furnish clear simple discussions that lend great insight into complicated physical phenomena.