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Surface Science: Principles and Current Applications

Editat de R. J. MacDonald, Edmund C. Taglauer, Klaus Wandelt
en Limba Engleză Paperback – 14 dec 2011
Modern technologies increasingly rely on low-dimensional physics at interfaces and in thin-films and nano-structures. Surface science holds a key position in providing the experimental methods and theoretical models for a basic understanding of these effects. This book includes case studies and status reports about research topics such as: surface structure determination by tensor-LEED and surface X-ray diffraction; the preparation and detection of low-dimensional electronic surface states; quantitative surface compositional analysis; the dynamics of adsorption and reaction of adsorbates, e.g. kinetic oscillations; the characterization and control of thin-film and multilayer growth including the influence of surfactants; a critical assessment of the surface physics approach to heterogeneous catalysis.
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Specificații

ISBN-13: 9783642802836
ISBN-10: 3642802834
Pagini: 388
Ilustrații: X, 374 p. 35 illus.
Dimensiuni: 155 x 235 x 20 mm
Greutate: 0.54 kg
Ediția:Softcover reprint of the original 1st ed. 1996
Editura: Springer Berlin, Heidelberg
Colecția Springer
Locul publicării:Berlin, Heidelberg, Germany

Public țintă

Research

Cuprins

I. Structure at Single Crystal Surfaces.- Tensor-LEED, Diffuse LEED, and LEED Holography.- 3-D Surface Structure Analysis by X-Ray Diffraction.- Surface Structural Determination by VLEED Analysis.- Surface Structure Investigation with Ion Scattering and Scanning Tunneling Microscopy at Oxygen and Nitrogen Covered Cu3Au Surfaces.- II. Surface Electronic Properties.- Surface States on Metals.- Low-Dimensional States on Metal Surfaces.- Electronic Properties of Semiconductor Surfaces and Fermi Surface Studies Using Photoelectron Spectroscopy.- Recent Progress in Investigation of Luminescent and Electrical Phenomena from Semiconductor Cleavage.- III. Surface Composition Analysis.- Problems of Quantitative Surface Composition Analysis Using LEIS.- Studies of Alloy Surfaces by Low-Energy Ion Scattering.- Ion Beam Mixing in Metals.- Surface Segregation and Preferential Sputtering of Binary Alloys.- IV. Properties and Influence of Adsorbates.- The Determination of Adsorbate-Substrate Bonding via UPS.- Oxygen on Cu(100): From Physisorption to Chemically Induced Reconstruction.- Inelastic Phenomena of Low-Energy Particle-Surface Interactions.- Adsorption on Epitaxial Oxide Films as Model Systems for Heterogeneous Catalysis.- Kinetic Oscillations on Single Crystal Surfaces.- V. Thin Film Growth and Interfaces.- Homoepitaxiai Growth of Metals and the Role of Surfactants.- Metal-on-Metal Heteroepitaxy and the Influence of a Surfactant: Cu/O/Ru(0001).- Energetic Condensation as a Means of Inducing the Growth of Films Containing High Pressure Phases.- Atomically Abrupt Interfaces of Compound Semiconductor Heterostructures: The AlAs/GaAs Case.- Deposition and Characterization of Thin Polyimide Films.- VI. Characterization of Catalysts.- The Application of Surface Physics in Catalysis Science: Understanding Heterogeneous Catalysts for Partial Oxidation.- Characterization of Zeolite Catalysts and Related Materials by Multinuclear Solid-State NMR Spectroscopy.- Spectroscopic Studies of Zeolite Single Crystals.- Analysis of Alumina-Supported Catalysts by XPS.- Precious Metal-Ceria Interactions in Car Exhaust Catalysts.

Textul de pe ultima copertă

Modern technologies increasingly rely on low-dimensional physics at interfaces and in thin-films and nano-structures. Surface science holds a key position in providing the experimental methods and theoretical models for a basic understanding of these effects. This book includes case studies and status reports about research topics such as: surface structure determination by tensor-LEED and surface X-ray diffraction; the preparation and detection of low-dimensional electronic surface states; quantitative surface compositional analysis; the dynamics of adsorption and reaction of adsorbates, e.g. kinetic oscillations; the characterization and control of thin-film and multilayer growth including the influence of surfactants; a critical assessment of the surface physics approach to heterogeneous catalysis.