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Advanced Silicon & Semiconducting Silicon-Alloy Based Materials & Devices

Editat de Jo Nijs
en Limba Engleză Hardback – 1994
One of the first books to cover advanced silicon-based technologies, Advanced Silicon and Semiconducting Silicon Alloy-Based Materials and Devices presents important directions for research into silicon, its alloy-based semiconducting devices, and its development in commercial applications. The first section deals with single/mono crystalline silicon, focusing on the effects of heavy doping; the structure and electronic properties of defects and their impact on devices; the MBE of silicon, silicon alloys, and metals; CVD techniques for silicon and silicon germanium; the material properties of silicon germanium strained layers; silicon germanium heterojunction bipolar applications; FETs, IR detectors, and resonant tunneling devices in silicon, silicon germanium, and d-doped silicon; and the fascinating properties of crystalline silicon carbide and its applications. The second section explores polycrystalline silicon. It examines large grain polysilicon substrates for solar cells; the properties, analysis, and modeling of polysilicon TFTs; the technology of polysilicon TFTs in LCD displays; and the use of polycrystalline silicon and its alloys in VLSI applications. With contributors from leading academic and industrial research centers, this book provides wide coverage of fabrication techniques, material properties, and device applications.
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Specificații

ISBN-13: 9780750302999
ISBN-10: 0750302992
Pagini: 466
Dimensiuni: 156 x 234 x 27 mm
Greutate: 0.93 kg
Ediția:1
Editura: CRC Press
Colecția CRC Press

Public țintă

Professional

Cuprins

Preface. Introduction. Part one: Sincle crystalline silicon and its alloys. Heavy doping effects in silicon (P/Van Miegham and R P Mertens). Defects in crystalline silicon (C Claeys and J Vanhellemont). Molecular beam epitaxy of silicon, silicon alloys and metals (E Kasper and C M Falco). Low thermal budget chemical vapour deposition techniques for Si and SiGe (M R Caymax and W Y Leong). Materials properties of (strained) SiGe layers (J Poortmans, S C Jain, J Nijs and R Van Overstraeten). SiGe heterojunction bipolar application (J Poortmans, S C Jain And J Nijs). Field-effect transistors, infrared detectors, and resonant tunneling devices in silicon/silicon-germanium and ^D*d-doped silicon (M Willander). Crystalline silicon-carbide and its applications (T Sugii). Part Two: Polycrystalline silicon. Large Grain Polysilicon Substrates for Solar Cells, Properties, analysis and modelling of polysilicon TFTs (P Migliorato and M Quinn). Application and Technology of polysilicon thin film transistors for liquid crystal displays. (C Baert) The use of polycrystalline silicon and its alloys in VLSI applications (M Y Ghannam). Biographical details. Keyword index.

Recenzii

"… should at least become a recognized text …"
-N.D. Young, Semicond. Sci. Technol.

Descriere

One of the first books to cover advanced silicon-based technologies, this volume presents important directions for research into silicon, its alloy-based semiconducting devices, and its development in commercial applications. The book focuses on both single crystalline silicon and polycrystalline silicon, covering the chemistry and technology of material fabrication, physics and material properties, and device applications. It shows how the electronic and optical properties of SiGe strained layers make these materials suitable for advanced applications in high-speed transistors and diodes, and optical detectors for night vision systems. With contributors from leading academic and industrial research centers, the book contains extensive references to primary research papers.