Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions

Autor Stephen M. Rossnagel, William D. Westwood, Jerome J. Cuomo

en Limba Engleză Hardback – 30 dec 1990

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

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Specificații

ISBN-13: 9780815512202
ISBN-10: 0815512201
Pagini: 546
Dimensiuni: 152 x 229 x 31 mm
Greutate: 0.82 kg
Ediția:New.
Editura: ELSEVIER SCIENCE

Public țintă

Scientists, engineers, graduate students in the fields of semiconductors, thin films, energy, environment, automotive, medical and food packaging.

Cuprins

Techniques for IC ProcessingIntroduction to Plasma Concepts and Discharge ConfigurationsFundamentals of Sputtering and ReflectionBombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and HalidesRF Diode Sputter Etching and DepositionMagnetron Plasma Deposition ProcessesBroad-Beam Ion SourceReactive Ion EtchingReactive Sputter DepositionPlasma Enhanced Chemical Vapor Deposition of Thin Films for MicroelectronicsElectron Cyclotron Resonance Microwave Discharges for Etching and Thin Film DepositionHollow Cathode Etching and DepositionIon PlatingIonized Cluster Beam (ICB) Deposition TechniquesThe Activated Reactive Evaporation (ARE) ProcessFormation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)Selective Bias Sputter DepositionVacuum Arc-Based ProcessingIon Source Interactions: General UnderstandingsIon Assisted DepositionMicrostructural Control of Plasma-Sputtered Refractory Coatings

Recenzii

"The text provides and excellent reference for plasma processing." --SAMPE Journal

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