Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis
Autor Jerome J. Cuomo, Stephen M. Rossnagel, Harold R. Kaufmanen Limba Engleză Hardback – 30 dec 1989
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Specificații
ISBN-13: 9780815511991
ISBN-10: 081551199X
Pagini: 456
Dimensiuni: 152 x 229 x 25 mm
Greutate: 0.82 kg
Editura: ELSEVIER SCIENCE
ISBN-10: 081551199X
Pagini: 456
Dimensiuni: 152 x 229 x 25 mm
Greutate: 0.82 kg
Editura: ELSEVIER SCIENCE
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Public țintă
Engineers, technicians, and plant personnel in the semiconductor and related industries.Cuprins
Perspective on Past, Present and Future Uses of Ion Beam TechnologyPart I. Ion Beam TechnologyGridded Broad-beam Ion SourcesECR Ion SourcesHall Effect Ion SourcesIonized Cluster Beam (ICB) Deposition and EpitaxyPart II. Sputtering PhenomenaQuantitative SputteringLaser-induced Fluorescence as a Tool for the Study of Ion Beam SputteringCharacterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization DetectionPart III. Film Modification and SynthesisThe Modification of Films by Ion BombardmentControl of Film Properties by Ion-assisted Deposition Using Broad Beam SourcesEtching with Directed BeamsFilm Growth Modification by Concurrent Ion Bombardment: Theory and SimulationInterface Structure and Thin Film AdhesionModification of Thin Films by Off-normal Incidence Ion BombardmentIon Beam Interactions with Polymer SurfacesTopography: Texturing EffectsMethods and Techniques of Ion Beam ProcessesIon-assisted Dielectric and Optical CoatingsDiamond and Diamond-like Thin Films by Ion Beam TechniquesIndex