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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Autor John E.J. Schmitz
en Limba Engleză Hardback – 30 dec 1992
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
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Specificații

ISBN-13: 9780815512882
ISBN-10: 0815512880
Pagini: 251
Dimensiuni: 152 x 229 x 18 mm
Greutate: 0.48 kg
Ediția:New.
Editura: ELSEVIER SCIENCE

Public țintă

Engineers and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, filter and other industries.

Cuprins

Introduction
The Blanket Tungsten Approach
The Selective Tungsten Approach
Blanket Versus Selective Tungsten
Tungsten as Interconnect Material
The Chemistry of CVD-W and Properties of Tungsten
The Deposition Equipment
Miscellaneous
Chemical Vapor Deposition of Tungsten Silicide
References
Author Index
Subject Index
Appendix: Unit Cells of W and WSi2

Recenzii

"After reading this book, an engineer should have all the necessary background." --European Semiconductor