Hydrogen in Crystalline Semiconductors: Springer Series in Materials Science, cartea 16
Autor Stephen J. Pearton H.-J. Queisser Autor James W. Corbett, Michael Stavolaen Limba Engleză Paperback – 29 iun 1992
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Specificații
ISBN-13: 9783540554912
ISBN-10: 3540554912
Pagini: 376
Ilustrații: XI, 363 p.
Dimensiuni: 155 x 235 x 20 mm
Greutate: 0.53 kg
Ediția:Softcover reprint of the original 1st ed. 1992
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Series in Materials Science
Locul publicării:Berlin, Heidelberg, Germany
ISBN-10: 3540554912
Pagini: 376
Ilustrații: XI, 363 p.
Dimensiuni: 155 x 235 x 20 mm
Greutate: 0.53 kg
Ediția:Softcover reprint of the original 1st ed. 1992
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Series in Materials Science
Locul publicării:Berlin, Heidelberg, Germany
Public țintă
ResearchCuprins
1. Introduction.- 2. Hydrogen Incorporation in Crystalline Semiconductors.- 2.1 Techniques for Hydrogen Incorporation in Semiconductors.- 2.2 Survey of the Configurations of Hydrogen in Semiconductors.- 3. Passivation of Deep Levels by Hydrogen.- 3.1 Deep-Level Passivation in Silicon.- 3.2 Passivation of Defects in Gallium Arsenide.- 3.3 Aluminum Gallium Arsenide.- 3.4 Gallium Phosphide.- 3.5 CdHgTe, Zn3P2.- 3.6 Germanium.- 4. Shallow Impurity Passivation by Atomic Hydrogen.- 4.1 Silicon.- 4.2 Gallium Arsenide.- 4.3 AlGaAs.- 4.4 CdTe and ZnTe.- 4.5 Gallium Phosphide.- 4.6 Germanium.- 4.7 Indium Phosphide.- 4.8 BN and BP.- 4.9 Correlation with Muonium.- 5. Microscopic Properties of Hydrogen-Related Complexes in Silicon from Vibrational Spectroscopy.- 5.1 Vibrational Spectroscopy of H-Related Complexes.- 5.2 Uniaxial Stress Studies of H-Related Complexes.- 5.3 Hydrogen Motion in the B-H Complex.- 5.4 Conclusion.- 6. The Microscopic Characteristics of Impurity-Hydrogen Complexes in III-V Semiconductors.- 6.1 Acceptor-H Complexes.- 6.2 Donor-H Complexes.- 6.3 Unintentional Hydrogenation.- 6.4 Uniaxial Stress Studies.- 6.5 Cluster Calculations for H-Related Complexes in GaAs.- 6.6 Conclusion.- 7. Hydrogen, and Semiconductor Surfaces and Surface Layers.- 7.1 Etching of Silicon Surfaces by Hydrogen.- 7.2 Plasma Etching.- 7.3 Implantation of Protons.- 7.4 Hydrogen on Semiconductor Surfaces.- 8. Hydrogen-Related Defects in Semiconductors.- 8.1 Hydrogen-Related Defects in Silicon.- 8.2 Hydrogen-Related Defects in Germanium.- 8.3 Hydrogen-Related Defects in Compound Semiconductors.- 8.4 Hydrogen-Related IR Bands in Silicon.- 9. Diffusion of Hydrogen in Semiconductors.- 9.1 Diffusion of Hydrogen in Solids.- 9.2 Diffusion Equations.- 9.3 Analysis of Diffusion Profiles.- 9.4 Diffusion of Hydrogen in Silicon.- 9.5 Diffusion of Hydrogen in Germanium.- 9.6 Diffusion in Gallium Arsenide.- 9.7 Diffusion of Hydrogen in Other Materials.- 9.8 Summary.- 10. Resonance Studies Pertinent to Hydrogen in Semiconductors.- 10.1 Electron Paramagnetic Resonance.- 10.2 Related Muon Studies.- 10.3 Perturbed Angular Correlation.- 11. Prevalence of Hydrogen Incorporation and Device Applications.- 11.1 Experimental Studies of Hydrogen Incorporation.- 11.2 Hydrogen Sensing with MOS Structures.- 11.3 Hydrogen in III-V Semiconductors.- 12. Hydrogen and the Mechanical Properties of Semiconductors.- 12.1 Hydrogen Embrittlement.- 12.2 Hydrogen-Related Defects.- 12.3 m-V Semiconductors.- References.