Microbeam and Nanobeam Analysis: Mikrochimica Acta Supplementa, cartea 13
Editat de Daniele Benoit, Jean-Francois Bresse, Luc Van't dack, Helmut Werner, Johann Wernischen Limba Engleză Paperback – 6 noi 1996
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Specificații
ISBN-13: 9783211828748
ISBN-10: 3211828745
Pagini: 660
Ilustrații: XI, 643 p. 98 illus., 4 illus. in color.
Dimensiuni: 210 x 280 x 35 mm
Greutate: 1.46 kg
Ediția:Softcover reprint of the original 1st ed. 1996
Editura: SPRINGER VIENNA
Colecția Springer
Seria Mikrochimica Acta Supplementa
Locul publicării:Vienna, Austria
ISBN-10: 3211828745
Pagini: 660
Ilustrații: XI, 643 p. 98 illus., 4 illus. in color.
Dimensiuni: 210 x 280 x 35 mm
Greutate: 1.46 kg
Ediția:Softcover reprint of the original 1st ed. 1996
Editura: SPRINGER VIENNA
Colecția Springer
Seria Mikrochimica Acta Supplementa
Locul publicării:Vienna, Austria
Public țintă
ResearchCuprins
Monte Carlo Simulation Techniques for Quantitative X-Ray Microanalysis.- Transport Equation Approach to Electron Microbeam Analysis: Fundamentals and Applications.- Use of Soft X-Rays in Microanalysis.- Intensity Measurement of Wavelength Dispersive X-Ray Emission Bands: Applications to the Soft X-Ray Region.- Synchrotron Radiation Induced X-ray Microfluorescence Analysis.- Particle-Induced X-Ray Emission — A Quantitative Technique Suitable for Microanalysis.- Cathodoluminescence Microscopy and Spectroscopy of Semiconductors and Wide Bandgap Insulating Materials.- Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS).- Three-Dimensional Nanoanalysis with the Tomographic Atom-Probe.- Microanalysis at Atomic Resolution.- Composition of Vanadium Carbides Formed by Solidification in Fe-V-C-M Alloys: Influence of Additions (M = Al, Cu, Mo).- Electron Transmission Coefficient for Oblique Angle of Incidence.- Depth Distribution Function for Oblique Angle of Incidence.- Simulation of EDS Spectra Using X-RES Software.- On the Use of the GeL? Line in Thin Film X-Ray Microanalysis of Si1-x Gex/Si Heterostructures.- Computer Simulations of the X-Ray Intensity Distribution from Submicron Particles Embedded in a Matrix.- Determination of Rare Earth Elements in Biological and Mineral Apatite by EPMA and LAMP-ICP-MS.- Quantitative Analysis of the Compound Layer of Plasma Nitrided Pure Iron.- Correction of the Edge Effect in Auger Electron Microscopy.- Low Energy Imaging of Nonconductive Surfaces in SEM.- Investigation of the Bonding Mechanism of Glass Ceramic Layers on Metal Alloys.- Monte Carlo Method for Quantitative Analysis of Bulk and Layered Samples.- SIMS Linescan Profiling of Chemically Bevelled Semiconductors: a Method of Overcoming Ion Beam Induced Segregation in DepthProfiling.- Experimental Verification of Theoretical Models Simulating the Temperature Increase in EPMA of Glass.- Quantitation of Mineral Elements of Different Fruit Pollen Grains.- Electron Beam Induced Migration of Alkaline Ions in Silica Glass.- Application of the Boltzmann Transport Equation in the Thickness Determination of Thin Films.- Characterisation of the Shape of Microparticles via Fractal and Fourier Analyses of Scanning Electron Microscope Images.- Calculation of the Surface Ionisation Using Analytical Models of Electron Backscattering.- Thickness Determination of Thin Insulating Layers.- High Energy and Angular Resolution Dynamic Secondary Ion Mass Spectrometry.- EPMA and Mass Spectrometry of Soil and Grass Containing Radioactivity from the Nuclear Accident at Chernobyl.- Application of a New Monte Carlo Simulation Algorithm to Electron Probe Microanalysis.- Topography Development on Single Crystal MgO Under Ion Beam Bombardment.- Determination of SPM TIP Shape Using Polystyrene Latex Balls.- Combined Characterization of Nanostructures by AEM and STM.- Study of Quasi-Fractal Many-Particle-Systems and Percolation Networks by Zero-Loss Spectroscopic Imaging, Electron Energy-Loss Spectroscopy and Digital Image Analysis.- Calculation of Bremsstrahlung Spectra for Multilayer Samples.- Thickness Measurement of Thin Films by EPMA — Influence of ? (0), MAC’s and Substrate.- A Simple Procedure to Check the Spectral Response of an EDX Detector.- Virtual WDS.- Monte Carlo Simulation Program with a Free Configuration of Specimen and Detector Geometries.- Barriers to Energy Dispersive Spectrometry with Low Energy X-Rays.- Measurements of Ga1-xAlxAs Layers on GaAs with EDS.- The Relative Intensity Factor for La Radiation Considering the Different Mass Absorptionof La and L? Radiation.- Determination of the Solubility of Cerium in BaTiO3 by Quantitative WDS Electron Probe Microanalysis.- Simulation of X-Ray Diffraction Profiles of Gradually Relaxed Epilayers.- Monte Carlo Simulation of Electron Scattering for Arbitrary 2D Structures Using a Modified Quadtree Geometry Discretization.- Chemical-Bond Characterization of Nanostructures by EELS.- Local Determination of Carbon by Combining Beta-Autoradiography and Electron Microprobe Analysis.- The Check of the Elastic Scattering Model in Monte-Carlo Simulation.- True Colour X-Ray Vision for Electron Microscopy and Microanalysis.- Determination of the Oxidation States of Nb by Auger Electron Spectroscopy.- Study by SIMS of the 54Cr and 18O Diffusion in Cr2 O3 and in Cr2O3 Scales.- Comparison of Back-Foil Scanning X-Ray Microfluorescence and Electron Probe X-Ray Microanalysis for the Elemental Characterisation of Thin Coatings.- Electron Probe X-Ray Microanalysis of Coatings.- Analysis of Layers: X-Ray Maps of Change in Thickness Obtained by Electron Macroprobe.- Comparison of Simulated and Experimental Auger Intensities of Au, Pt, Ni and Siin Absolute Units.- Practical Aspects and Applications of EPMA at Low Electron Energies.- Oxidation and Reduction Processes of Be/BeO Induced by Electrons.