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Chemical Vapor Deposition Polymerization: The Growth and Properties of Parylene Thin Films

Autor Jeffrey B. Fortin, Toh-Ming Lu
en Limba Engleză Hardback – 30 noi 2003
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed.
This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
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Specificații

ISBN-13: 9781402076886
ISBN-10: 1402076886
Pagini: 124
Ilustrații: XVII, 102 p.
Dimensiuni: 155 x 235 x 13 mm
Greutate: 0.33 kg
Ediția:2004
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States

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Research

Cuprins

1. Introduction.- 2. Deposition Equipment.- 3. Step-by-Step Guide to Depositing Parylene.- 4. Parylene-N Precursor Chemistry.- 5. Deposition Kinetics for Polymerization via the Gorham Route.- 6. Film Properties.- 7. Other CVD Polymers.- References.