Electron Energy-Loss Spectroscopy in the Electron Microscope
Autor R.F. Egertonen Limba Engleză Paperback – oct 2014
Toate formatele și edițiile | Preț | Express |
---|---|---|
Paperback (1) | 2055.26 lei 6-8 săpt. | |
Springer Us – oct 2014 | 2055.26 lei 6-8 săpt. | |
Hardback (1) | 2066.24 lei 6-8 săpt. | |
Springer Us – 29 iul 2011 | 2066.24 lei 6-8 săpt. |
Preț: 2055.26 lei
Preț vechi: 2506.41 lei
-18% Nou
Puncte Express: 3083
Preț estimativ în valută:
393.33€ • 408.57$ • 326.72£
393.33€ • 408.57$ • 326.72£
Carte tipărită la comandă
Livrare economică 03-17 februarie 25
Preluare comenzi: 021 569.72.76
Specificații
ISBN-13: 9781489986498
ISBN-10: 1489986499
Pagini: 504
Ilustrații: XII, 491 p.
Dimensiuni: 155 x 235 x 26 mm
Greutate: 0.7 kg
Ediția:3rd ed. 2011
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
ISBN-10: 1489986499
Pagini: 504
Ilustrații: XII, 491 p.
Dimensiuni: 155 x 235 x 26 mm
Greutate: 0.7 kg
Ediția:3rd ed. 2011
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
Public țintă
ResearchCuprins
Chapter 1. An Introduction to EELS
1.1. Interaction of Fast Electrons with a Solid
1.2. The Electron Energy-Loss Spectrum
1.3. The Development of Experimental Techniques
1.3.1. Energy-Selecting (Energy-Filtering) Electron Microscopes
1.3.2. Spectrometers as Attachments to Electron Microscopes
1.4. Alternative Analytical Methods
1.4.1. Ion-Beam Methods
1.4.2. Incident Photons
1.4.3. Electron-Beam Techniques
1.5. Comparison of EELS and EDX Spectroscopy
1.5.1. Detection Limits and Spatial Resolution
1.5.2. Specimen Requirements
1.5.3. Accuracy of Quantification
1.5.4. Ease of Use and Information Content
1.6. Further Reading
Chapter 2. Energy-Loss Instrumentation
2.1. Energy-Analyzing and Energy-Selecting Systems
2.1.1. The Magnetic-Prism Spectrometer
2.1.2. Energy-Filtering Magnetic-Prism Systems
2.1.3. The Wien Filter
2.1.4. Electron Monochromators
2.2. Optics of a Magnetic-Prism Spectrometer
2.2.1. First-Order Properties
2.2.2. Higher-Order Focusing
2.2.3. Spectrometer Sesigns
2.2.4. Practical Considerations
2.2.5. Spectrometer Alignment
2.3. The Use of Prespectrometer Lenses
2.3.1. TEM Imaging and Diffraction Modes
2.3.2. Effect of Lens Aberrations on Spatial Resolution
2.3.3. Effect of Lens Aberrations on Collection Efficiency
2.3.4. Effect of TEM Lenses on Energy Resolution
2.3.5. STEM Optics
2.4. Recording the Energy-Loss Spectrum
2.4.1.Spectrum Shift and Scanning
2.4.2. Spectrometer Background
2.4.3. Coincidence Counting
2.4.4. Serial Recording of the Energy-Loss Spectrum
2.4.5. DQE of a Single-Channel System
2.4.6. Serial-Mode Signal Processing
2.5. Parallel Recording of Energy-Loss Data
2.5.1. Types of Self-Scanning Diode Array
2.5.2. Indirect Exposure Systems
2.5.3. Direct Exposure Systems
2.5.4. DQE of a Parallel-Recording System
2.5.5. Dealing with Diode Array Artifacts
2.6. Energy-Selected Imaging (ESI)
2.6.1. Post-Column Energy Filter
2.6.2. In-Column Filters
2.6.3. Energy Filtering in STEM Mode
2.6.4. Spectrum-Imaging
2.6.5. Elemental Mapping
2.6.6. Comparison of Energy-Filtered TEM and STEM
2.6.7. Z-Contrast and Z-Ratio Imaging
Chapter 3. Physics of Electron Scattering
3.1. Elastic Scattering
3.1.1. General Formulas
3.1.2. Atomic Models
3.1.3. Diffraction Effects
3.1.4. Electron Channeling
3.1.5. Phonon Scattering
3.1.6. Energy Transfer in Elastic Scattering
3.2. Inelastic Scattering
3.2.1. Atomic Models
3.2.2. Bethe Theory
3.2.3. Dielectric Formulation
3.2.4. Solid-State Effects
3.3. Excitation of Outer-Shell Electrons
3.3.1. Volume Plasmons
3.3.2. Single-Electron Excitation
3.3.3. Excitons
3.3.4. Radiation Losses
3.3.5. Surface Plasmons
3.3.6. Surface-Reflection Spectra
3.3.7. Plasmon Modes in Small Particles
3.4. Single, Plural, and Multiple Scattering
3.4.1. Poisson's Law
3.4.2. Angular Distribution of Plural Inelastic Scattering
3.4.3. Influence of Elastic Scattering
3.4.4. Multiple Scattering
3.4.5. Coherent Double-Plasmon Excitation
3.5. The Spectral Background to Inner-Shell Edges
3.5.1. Valence-Electron Scattering
3.5.2. Tails of Core-Loss Edges
3.5.3. Bremsstrahlung Energy Losses
3.5.4. Plural Scattering Contributions to the Background
3.6. Atomic Theory of Inner-Shell Excitation
3.6.1. Generalized Oscillator Strength
3.6.2. Relativistic Kinematics of Scattering
3.6.3. Ionization Cross Sections
3.7. The Form of Inner-Shell Edges
3.7.1. Basic Edge Shapes
3.7.2. Dipole Selection Rule
3.7.3. Effect of Plural Scattering
3.7.4. Chemical Shifts in Threshold Energy
3.8. Near-Edge Fine Structure (ELNES)
3.8.1. Densities-of-States Interpretation
3.8.2. Multiple-Scattering Interpretation
3.8.3. Molecular-Orbital Theory
3.8.4. Multiplet and Crystal-Field Effects
3.9. Extended Energy-Loss Fine Structure (EXELFS)
3.10. Core Excitation in Anisotropic Materials
3.11. Delocalization of inelastic Scattering
Chapter 4. Quantitative Analysis of Energy-Loss Data
4.1. Deconvolution of Low-Loss Spectra
4.1.1. Fourier-Log Method
4.1.2. Fourier-Ratio Method
4.1.3. Bayesian Deconvolution
4.1.4. Other Methods
4.2. Kramers–Kronig Analysis
4.3.Deconvolution of Core-Loss Data
4.3.1. Fourier-Log Method
4.3.2. Fourier-Ratio Method
4.3.3. Bayesian Deconvolution
4.3.4. Other Methods
4.4. Separation of Spectral Components
4.4.1. Least-Squares Fitting
4.4.2. Two-Area Fitting
4.4.3. Background-Fitting Errors
4.4.4. Multiple Least-Squares Fitting
4.4.5. Multivariate Statistical Analysis
4.4.6. Energy- and Spatial-Difference Techniques
4.5. Elemental Quantification
4.5.1. Integration Method
4.5.2. Calculation of Partial Cross Sections
4.5.3. Correction for Incident-Beam Convergence
4.5.4. Quantification from MLS Fitting
4.6. Analysis of Extended Energy-Loss Fine Structure
4.6.1. Fourier-Transform Method
4.6.2. Curve-Fitting Procedure
4.7. Simulation of Energy-Loss Near-Edge Structure (ELNES)
4.7.1. Multiple-Scattering Calculations
4.7.2. Band-Structure Calculations
Chapter 5. TEM Applications of EELS
5.1. Measurement of Specimen Thickness
5.1.1. Log-Ratio Method
5.1.2. Absolute Thickness from the K–K Sum Rule
5.1.3. Mass-Thickness from the Bethe Sum Rule
5.2. Low-Loss Spectroscopy
5.2.1. Identification from Low-Loss Fine Structure
5.2.2. Measurement of Plasmon Energy and Alloy Composition
5.2.3. Characterization of Small Particles
5.3. Energy-Filtered Images and Diffraction Patterns
5.3.1. Zero-Loss Images
5.3.2. Zero-Loss Diffraction Patterns
5.3.3. Low-Loss Images
5.3.4. Z-Ratio Images
5.3.5.Contrast Tuning and MPL Imaging
5.3.6. Core-Loss Images and Elemental Mapping
5.4. Elemental Analysis from Core-Loss Spectroscopy
5.4.1. Measurement of Hydrogen and Helium
5.4.2. Measurement of Lithium, Beryllium, and Boron
5.4.3. Measurement of Carbon, Nitrogen, and Oxygen
5.4.4. Measurement of Fluorine and Heavier Elements
5.5. Spatial Resolution and Detection Limits
5.5.1. Electron-Optical Considerations
5.5.2. Loss of Resolution due to Elastic Scattering
5.5.3. Delocalization of Inelastic Scattering
5.5.4. Statistical Limitations and Radiation Damage
5.6. Structural Information from EELS
5.6.1. Orientation Dependence of Ionization Edges
5.6.2. Core-Loss Diffraction Patterns
5.6.3. ELNES Fingerprinting
5.6.4. Valency and Magnetic Measurements from White-Line Ratios
5.6.5. Use of Chemical Shifts
5.6.6. Use of Extended Fine Structure
5.6.7. Electron-Compton (ECOSS) Measurements
5.7. Application to Specific Materials
5.7.1. Semiconductors and Electronic Devices
5.7.2. Ceramics and High-Temperature Superconductors
5.7.3. Carbon-Based Materials
5.7.4. Polymers and Biological Specimens
5.7.5. Radiation Damage and Hole Drilling
Appendix A. Bethe Theory forHigh Incident Energies and Anisotropic Materials
Appendix B. Computer Programs
B.1. First-Order Spectrometer Focusing
B.2. Cross Sections for Atomic Displacement and High-Angle Elastic Scattering
B.3. Lenz-Model Elastic and Inelastic CrossSections
B.4. Simulation of a Plural-Scattering Distribution
B.5. Fourier-Log Deconvolution
B.6. Maximum-Likelihood Deconvolution
B.7. Drude Simulation of a Low-Loss Spectrum
B.8. Kramers-Kronig Analysis
B.9. Kröger Simulation of a Low-Loss Spectrum
B.10. Core-Loss Simulation
B.11. Fourier-Ratio Deconvolution
B.12. Incident-Convergence Correction
B.13. Hydrogenic K-shell Cross Sections
B.14. Modified-Hydrogenic L-shell Cross Sections
B.15. Parameterized K-, L-, N-, N- and O-shell Cross Sections B.16. Measurement of Absolute Specimen Thickness
B.17. Total-Inelastic and Plasmon Mean Free Paths
B.18. Constrained Power-Law Background Fitting
Appendix C. Plasmon Energies and Inelastic Mean Free Paths
Appendix D. Inner-Shell Energies and Edge Shapes
Appendix E. Electron Wavelengths and Relativistic Factors; Physical Constants
Appendix F. Options for Energy-Loss Data Acquisition
References
Indexetc.
1.1. Interaction of Fast Electrons with a Solid
1.2. The Electron Energy-Loss Spectrum
1.3. The Development of Experimental Techniques
1.3.1. Energy-Selecting (Energy-Filtering) Electron Microscopes
1.3.2. Spectrometers as Attachments to Electron Microscopes
1.4. Alternative Analytical Methods
1.4.1. Ion-Beam Methods
1.4.2. Incident Photons
1.4.3. Electron-Beam Techniques
1.5. Comparison of EELS and EDX Spectroscopy
1.5.1. Detection Limits and Spatial Resolution
1.5.2. Specimen Requirements
1.5.3. Accuracy of Quantification
1.5.4. Ease of Use and Information Content
1.6. Further Reading
Chapter 2. Energy-Loss Instrumentation
2.1. Energy-Analyzing and Energy-Selecting Systems
2.1.1. The Magnetic-Prism Spectrometer
2.1.2. Energy-Filtering Magnetic-Prism Systems
2.1.3. The Wien Filter
2.1.4. Electron Monochromators
2.2. Optics of a Magnetic-Prism Spectrometer
2.2.1. First-Order Properties
2.2.2. Higher-Order Focusing
2.2.3. Spectrometer Sesigns
2.2.4. Practical Considerations
2.2.5. Spectrometer Alignment
2.3. The Use of Prespectrometer Lenses
2.3.1. TEM Imaging and Diffraction Modes
2.3.2. Effect of Lens Aberrations on Spatial Resolution
2.3.3. Effect of Lens Aberrations on Collection Efficiency
2.3.4. Effect of TEM Lenses on Energy Resolution
2.3.5. STEM Optics
2.4. Recording the Energy-Loss Spectrum
2.4.1.Spectrum Shift and Scanning
2.4.2. Spectrometer Background
2.4.3. Coincidence Counting
2.4.4. Serial Recording of the Energy-Loss Spectrum
2.4.5. DQE of a Single-Channel System
2.4.6. Serial-Mode Signal Processing
2.5. Parallel Recording of Energy-Loss Data
2.5.1. Types of Self-Scanning Diode Array
2.5.2. Indirect Exposure Systems
2.5.3. Direct Exposure Systems
2.5.4. DQE of a Parallel-Recording System
2.5.5. Dealing with Diode Array Artifacts
2.6. Energy-Selected Imaging (ESI)
2.6.1. Post-Column Energy Filter
2.6.2. In-Column Filters
2.6.3. Energy Filtering in STEM Mode
2.6.4. Spectrum-Imaging
2.6.5. Elemental Mapping
2.6.6. Comparison of Energy-Filtered TEM and STEM
2.6.7. Z-Contrast and Z-Ratio Imaging
Chapter 3. Physics of Electron Scattering
3.1. Elastic Scattering
3.1.1. General Formulas
3.1.2. Atomic Models
3.1.3. Diffraction Effects
3.1.4. Electron Channeling
3.1.5. Phonon Scattering
3.1.6. Energy Transfer in Elastic Scattering
3.2. Inelastic Scattering
3.2.1. Atomic Models
3.2.2. Bethe Theory
3.2.3. Dielectric Formulation
3.2.4. Solid-State Effects
3.3. Excitation of Outer-Shell Electrons
3.3.1. Volume Plasmons
3.3.2. Single-Electron Excitation
3.3.3. Excitons
3.3.4. Radiation Losses
3.3.5. Surface Plasmons
3.3.6. Surface-Reflection Spectra
3.3.7. Plasmon Modes in Small Particles
3.4. Single, Plural, and Multiple Scattering
3.4.1. Poisson's Law
3.4.2. Angular Distribution of Plural Inelastic Scattering
3.4.3. Influence of Elastic Scattering
3.4.4. Multiple Scattering
3.4.5. Coherent Double-Plasmon Excitation
3.5. The Spectral Background to Inner-Shell Edges
3.5.1. Valence-Electron Scattering
3.5.2. Tails of Core-Loss Edges
3.5.3. Bremsstrahlung Energy Losses
3.5.4. Plural Scattering Contributions to the Background
3.6. Atomic Theory of Inner-Shell Excitation
3.6.1. Generalized Oscillator Strength
3.6.2. Relativistic Kinematics of Scattering
3.6.3. Ionization Cross Sections
3.7. The Form of Inner-Shell Edges
3.7.1. Basic Edge Shapes
3.7.2. Dipole Selection Rule
3.7.3. Effect of Plural Scattering
3.7.4. Chemical Shifts in Threshold Energy
3.8. Near-Edge Fine Structure (ELNES)
3.8.1. Densities-of-States Interpretation
3.8.2. Multiple-Scattering Interpretation
3.8.3. Molecular-Orbital Theory
3.8.4. Multiplet and Crystal-Field Effects
3.9. Extended Energy-Loss Fine Structure (EXELFS)
3.10. Core Excitation in Anisotropic Materials
3.11. Delocalization of inelastic Scattering
Chapter 4. Quantitative Analysis of Energy-Loss Data
4.1. Deconvolution of Low-Loss Spectra
4.1.1. Fourier-Log Method
4.1.2. Fourier-Ratio Method
4.1.3. Bayesian Deconvolution
4.1.4. Other Methods
4.2. Kramers–Kronig Analysis
4.3.Deconvolution of Core-Loss Data
4.3.1. Fourier-Log Method
4.3.2. Fourier-Ratio Method
4.3.3. Bayesian Deconvolution
4.3.4. Other Methods
4.4. Separation of Spectral Components
4.4.1. Least-Squares Fitting
4.4.2. Two-Area Fitting
4.4.3. Background-Fitting Errors
4.4.4. Multiple Least-Squares Fitting
4.4.5. Multivariate Statistical Analysis
4.4.6. Energy- and Spatial-Difference Techniques
4.5. Elemental Quantification
4.5.1. Integration Method
4.5.2. Calculation of Partial Cross Sections
4.5.3. Correction for Incident-Beam Convergence
4.5.4. Quantification from MLS Fitting
4.6. Analysis of Extended Energy-Loss Fine Structure
4.6.1. Fourier-Transform Method
4.6.2. Curve-Fitting Procedure
4.7. Simulation of Energy-Loss Near-Edge Structure (ELNES)
4.7.1. Multiple-Scattering Calculations
4.7.2. Band-Structure Calculations
Chapter 5. TEM Applications of EELS
5.1. Measurement of Specimen Thickness
5.1.1. Log-Ratio Method
5.1.2. Absolute Thickness from the K–K Sum Rule
5.1.3. Mass-Thickness from the Bethe Sum Rule
5.2. Low-Loss Spectroscopy
5.2.1. Identification from Low-Loss Fine Structure
5.2.2. Measurement of Plasmon Energy and Alloy Composition
5.2.3. Characterization of Small Particles
5.3. Energy-Filtered Images and Diffraction Patterns
5.3.1. Zero-Loss Images
5.3.2. Zero-Loss Diffraction Patterns
5.3.3. Low-Loss Images
5.3.4. Z-Ratio Images
5.3.5.Contrast Tuning and MPL Imaging
5.3.6. Core-Loss Images and Elemental Mapping
5.4. Elemental Analysis from Core-Loss Spectroscopy
5.4.1. Measurement of Hydrogen and Helium
5.4.2. Measurement of Lithium, Beryllium, and Boron
5.4.3. Measurement of Carbon, Nitrogen, and Oxygen
5.4.4. Measurement of Fluorine and Heavier Elements
5.5. Spatial Resolution and Detection Limits
5.5.1. Electron-Optical Considerations
5.5.2. Loss of Resolution due to Elastic Scattering
5.5.3. Delocalization of Inelastic Scattering
5.5.4. Statistical Limitations and Radiation Damage
5.6. Structural Information from EELS
5.6.1. Orientation Dependence of Ionization Edges
5.6.2. Core-Loss Diffraction Patterns
5.6.3. ELNES Fingerprinting
5.6.4. Valency and Magnetic Measurements from White-Line Ratios
5.6.5. Use of Chemical Shifts
5.6.6. Use of Extended Fine Structure
5.6.7. Electron-Compton (ECOSS) Measurements
5.7. Application to Specific Materials
5.7.1. Semiconductors and Electronic Devices
5.7.2. Ceramics and High-Temperature Superconductors
5.7.3. Carbon-Based Materials
5.7.4. Polymers and Biological Specimens
5.7.5. Radiation Damage and Hole Drilling
Appendix A. Bethe Theory forHigh Incident Energies and Anisotropic Materials
Appendix B. Computer Programs
B.1. First-Order Spectrometer Focusing
B.2. Cross Sections for Atomic Displacement and High-Angle Elastic Scattering
B.3. Lenz-Model Elastic and Inelastic CrossSections
B.4. Simulation of a Plural-Scattering Distribution
B.5. Fourier-Log Deconvolution
B.6. Maximum-Likelihood Deconvolution
B.7. Drude Simulation of a Low-Loss Spectrum
B.8. Kramers-Kronig Analysis
B.9. Kröger Simulation of a Low-Loss Spectrum
B.10. Core-Loss Simulation
B.11. Fourier-Ratio Deconvolution
B.12. Incident-Convergence Correction
B.13. Hydrogenic K-shell Cross Sections
B.14. Modified-Hydrogenic L-shell Cross Sections
B.15. Parameterized K-, L-, N-, N- and O-shell Cross Sections B.16. Measurement of Absolute Specimen Thickness
B.17. Total-Inelastic and Plasmon Mean Free Paths
B.18. Constrained Power-Law Background Fitting
Appendix C. Plasmon Energies and Inelastic Mean Free Paths
Appendix D. Inner-Shell Energies and Edge Shapes
Appendix E. Electron Wavelengths and Relativistic Factors; Physical Constants
Appendix F. Options for Energy-Loss Data Acquisition
References
Indexetc.
Recenzii
From the reviews of the third edition:
“R.F. Egerton’s Electron Energy-loss Spectroscopy in the Electron Microscope is the standard text on the subject … . The book is now very up-to-date; R.F. Egerton has clearly continued adding to the text and references up to the last minute … . Springer have printed the book beautifully, with colour in place when needed and the references now give full details … . EEL spectroscopists … cannot do without this new edition.” (Ultramicroscopy, Vol. 116, 2012)
“R.F. Egerton’s Electron Energy-loss Spectroscopy in the Electron Microscope is the standard text on the subject … . The book is now very up-to-date; R.F. Egerton has clearly continued adding to the text and references up to the last minute … . Springer have printed the book beautifully, with colour in place when needed and the references now give full details … . EEL spectroscopists … cannot do without this new edition.” (Ultramicroscopy, Vol. 116, 2012)
Textul de pe ultima copertă
Within the last 30 years, electron energy-loss spectroscopy (EELS) has become a standard analytical technique used in the transmission electron microscope to extract chemical and structural information down to the atomic level. In two previous editions, Electron Energy-Loss Spectroscopy in the Electron Microscope has become the standard reference guide to the instrumentation, physics and procedures involved, and the kind of results obtainable. Within the last few years, the commercial availability of lens-aberration correctors and electron-beam monochromators has further increased the spatial and energy resolution of EELS. This thoroughly updated and revised Third Edition incorporates these new developments, as well as advances in electron-scattering theory, spectral and image processing, and recent applications in fields such as nanotechnology. The appendices now contain a listing of inelastic mean free paths and a description of more than 20 MATLAB programs for calculating EELS data.
"The text....contains a wealth of practical detail and experimentalinsight....This book is an essential purchase for any microscopist who is using, or planning to use, electron spectroscopy or spectroscopic imaging." – JMSA
"Provides the advanced student with an indispensible text and the experienced researcher with a valuable reference." -- American Scientist
- Considered the "Bible of EELS"
- Presents the only in-depth, single-author text for the still-expanding field of TEM-EELS
- Responds to many requests for the first new edition of this classic work since 1996
- Includes discussion of new spectrometer and detector designs, together with spectral-analysis techniques such as Bayesian deconvolution and multivariate statistical analysis
- Provides extended discussion of anisotropic materials, retardation effects, delocalization of inelastic scattering, and the simulation of energy-loss fine structure.
- Describes recent applications of EELS to fields such as nanotechnology, electronic devices and carbon-based materials.
- Offers extended coverage of radiation damage and delocalization as limits to spatial resolution.
"The text....contains a wealth of practical detail and experimentalinsight....This book is an essential purchase for any microscopist who is using, or planning to use, electron spectroscopy or spectroscopic imaging." – JMSA
"Provides the advanced student with an indispensible text and the experienced researcher with a valuable reference." -- American Scientist
Caracteristici
Considered the "Bible of EELS" Presents the only in-depth, single-author text for the still-expanding field of TEM-EELS Responds to many requests for the first new edition of this classic work since 1996 Includes discussion of new spectrometer and detector designs, together with spectral-analysis techniques such as Bayesian deconvolution and multivariate statistical analysis Provides extended discussion of anisotropic materials, retardation effects, delocalization of inelastic scattering, and the simulation of energy-loss fine structure. Describes recent applications of EELS to fields such as nanotechnology, electronic devices and carbon-based materials. Offers extended coverage of radiation damage and delocalization as limits to spatial resolution. From reviews of the first and second edition: The text....contains a wealth of practical detail and experimental insight....This book is an essential purchase for any microscopist who is using, or planning to use, electron spectroscopy or spectroscopic imaging." – JMSA Provides the advanced student with an indispensible text and the experienced researcher with a valuable reference." -- American Scientist Includes supplementary material: sn.pub/extras