Erosion and Growth of Solids Stimulated by Atom and Ion Beams: NATO Science Series E:, cartea 112
Editat de G. Kiriakidis, G. Carter, J.L. Whittonen Limba Engleză Paperback – 17 oct 2011
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Specificații
ISBN-13: 9789401084680
ISBN-10: 9401084688
Pagini: 480
Ilustrații: 480 p.
Dimensiuni: 155 x 235 x 25 mm
Greutate: 0.67 kg
Ediția:Softcover reprint of the original 1st ed. 1986
Editura: SPRINGER NETHERLANDS
Colecția Springer
Seria NATO Science Series E:
Locul publicării:Dordrecht, Netherlands
ISBN-10: 9401084688
Pagini: 480
Ilustrații: 480 p.
Dimensiuni: 155 x 235 x 25 mm
Greutate: 0.67 kg
Ediția:Softcover reprint of the original 1st ed. 1986
Editura: SPRINGER NETHERLANDS
Colecția Springer
Seria NATO Science Series E:
Locul publicării:Dordrecht, Netherlands
Public țintă
ResearchCuprins
1. Physical Sputtering of Elemental Metals and Semiconductors.- 2. Ion Implantation Mechanisms and Related Computational Issues.- 3. The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation.- 4. Theory of Surface Erosion and Growth.- 5. On the Composition of the Sputtered Flux from Metal Targets and their Compounds.- 6. Geometric Methods of Analysis.- 7. Surface Topographical Evolution: Computational Methods of Analysis.- 8. Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer.- 9. Experimental Studies of Morphology Development.- 10 Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Structures.- 11. Effects of Surface Impurities and Diffusion on Ion Bombardment-Induced Topography Formation.- 12. Ion Trapping and Cluster Growth.- 13. Bubbles, Blisters, and Exfoliation.- 14. Examples of Ion Bombardment Effects on Film Growth and Erosion Processes - Plasma and Beam Experiments.- 15. On the Modification of Metal/Ceramic Interfaces by Low Energy Ion/Atom Bombardment during Film Growth.- 16. Plasma Etching for Silicon Device Technology.- 17. Reactive Ion Etching of GaAs and Related III-V Compounds.- 18. Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification.- 19. Molecular Beam Epitaxy and Selective MBE Deposition of GaAs Device Structures.- 20. Applications of Ion Beams in Microlithography.- 21. In Situ Ion Beam Processing for Josephson Junction Fabrication.- 22. Effect of Ion Implantation on Subsequent Erosion and Wear Behavior of Solids.- 23. Problems, Prospects and Applications of Erosional/Depositional Phenomena.- 24. The Influence of Incidence Angle on Damage Production in In+ Ion Implanted Si.- 25. Striation Production by Grazing Ion Incidence on Si.- 26. Influence of Lattice Defects Produced by Ion Implantation on Electrical and Optical Properties of Bulk-Barrier-Diodes.- 27. Influence of the Target Environment on Angular Distribution of Sputtered Particles.- 28. Simulation of Near Atomic Scale Sputter Induced Morphology.- 29. Epitaxy of Erbium on Tungsten.- 30. Growth of Thin Films by UHV Ion Beam Sputtering Deposition Technique.- 31. Microstructural Analysis of Electronically Conductive Ceramic Coatings Synthesized by Reactive Ion Plating and Sputter Deposition.