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Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics: Woodhead Publishing Series in Electronic and Optical Materials

Editat de Fuccio Cristiano, Antonino La Magna
en Limba Engleză Paperback – 23 apr 2021
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering.

  • Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena
  • Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations
  • Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
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Specificații

ISBN-13: 9780128202555
ISBN-10: 0128202556
Pagini: 426
Ilustrații: 200 illustrations (180 in full color)
Dimensiuni: 152 x 229 mm
Greutate: 0.57 kg
Editura: ELSEVIER SCIENCE
Seria Woodhead Publishing Series in Electronic and Optical Materials


Public țintă

Materials Scientists and Engineers

Cuprins

1. Historical evolution of pulsed laser annealing for semiconductor processing
Guglielmo Fortunato, Luigi Mariucci, Alessandro Pecora, Vittorio Privitera, and Frank Simon
2. Laser-matter interactions
Spyros Stathopoulos and Dimitris Tsoukalas
3. Atomistic modeling of laser-related phenomena
Luis A.Marqués, María Aboy, Pedro López, Iván Santos, Lourdes Pelaz, Giuseppe Fisicaro
4. Laser annealing applications for semiconductor devices manufacturing
Karim Huet
5. Materials science issues related to the fabrication of highly doped junctions by laser annealing of Group IV semiconductors
Ray Duffy, Enrico Napolitani, and Fuccio Cristiano
6. Continuum modeling and TCAD simulations of laser-related phenomena in CMOS applications
Salvatore Francesco Lombardo, Ioannis Deretzis, Alberto Sciuto, and Antonino La Magna
7. Laser engineering of carbon materials for optoelectronic applications
Frédéric Antoni and François Stock
8. Optical hyperdoping
Wenjie Yang, Shao Qi Lim, and Jim S. Williams
9. Laser ultra-doped silicon: Superconductivity and applications
Francesca Chiodi, Richard Daubriac and Sébastien Kerdilès