Cantitate/Preț
Produs

Process and Device Simulation for MOS-VLSI Circuits: NATO Science Series E:, cartea 62

Editat de P. Antognetti, D.A. Antoniadis, Robert W. Dutton, W.G. Oldham
en Limba Engleză Paperback – 9 oct 2011
P. Antognetti University of Genova, Italy Director of the NATO ASI The key importance of VLSI circuits is shown by the national efforts in this field taking place in several countries at differ­ ent levels (government agencies, private industries, defense de­ partments). As a result of the evolution of IC technology over the past two decades, component complexi ty has increased from one single to over 400,000 transistor functions per chip. Low cost of such single chip systems is only possible by reducing design cost per function and avoiding cost penalties for design errors. Therefore, computer simulation tools, at all levels of the design process, have become an absolute necessity and a cornerstone in the VLSI era, particularly as experimental investigations are very time-consuming, often too expensive and sometimes not at all feasible. As minimum device dimensions shrink, the need to understand the fabrication process in a quanti tati ve way becomes critical. Fine patterns, thin oxide layers, polycristalline silicon interco~ nections, shallow junctions and threshold implants, each become more sensitive to process variations. Each of these technologies changes toward finer structures requires increased understanding of the process physics. In addition, the tighter requirements for process control make it imperative that sensitivities be unde~ stood and that optimation be used to minimize the effect of sta­ tistical fluctuations.
Citește tot Restrânge

Din seria NATO Science Series E:

Preț: 39245 lei

Nou

Puncte Express: 589

Preț estimativ în valută:
7511 7924$ 6259£

Carte tipărită la comandă

Livrare economică 02-16 ianuarie 25

Preluare comenzi: 021 569.72.76

Specificații

ISBN-13: 9789400968448
ISBN-10: 9400968442
Pagini: 636
Ilustrații: 636 p.
Dimensiuni: 155 x 235 x 33 mm
Greutate: 0.88 kg
Ediția:Softcover reprint of the original 1st ed. 1983
Editura: SPRINGER NETHERLANDS
Colecția Springer
Seria NATO Science Series E:

Locul publicării:Dordrecht, Netherlands

Public țintă

Research

Cuprins

Diffusion in Silicon.- Thermal Oxidation: Kinetics, Charges, Physical Models, and Interaction with Other Processes in VLSI Devices.- The Use of Chlorinated Oxides and Intrinsic Gettering Techniques for VLSI Processing.- Ion Implantation.- Beam Annealing of Ion Implanted Silicon.- Materials Characterization.- Modeling of Polycrystalline Silicon Structures for Integrated Circuit Fabrication Processes.- Two-Dimensional Process Simulation — Supra.- Numerical Simulation of Impurity Redistribution Near Mask Edges.- Optical and Deep UV Lithography.- Wafer Topography Simulation.- Analyses of Nonplanar Devices.- Two Dimensional MOS-Transistor Modeling.- Fielday — Finite Element Device Analyses.

Recenzii

`...this book is an extremely valuable collection on the crucial issues in numerical modeling of VLSI fabrication processes and devices, which will be useful to a large number of readers with diverse backgrounds.' American Scientist, 73 (1983)