Ion-Beam-Based Nanofabrication: Volume 1020: MRS Proceedings
Editat de Daryush Ila, John Baglin, Naoki Kishimoto, Paul K. Chuen Limba Engleză Hardback – 4 sep 2007
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Specificații
ISBN-13: 9781558999800
ISBN-10: 1558999809
Pagini: 256
Dimensiuni: 160 x 237 x 18 mm
Greutate: 0.46 kg
Editura: Cambridge University Press
Colecția Cambridge University Press
Seria MRS Proceedings
Locul publicării:New York, United States
ISBN-10: 1558999809
Pagini: 256
Dimensiuni: 160 x 237 x 18 mm
Greutate: 0.46 kg
Editura: Cambridge University Press
Colecția Cambridge University Press
Seria MRS Proceedings
Locul publicării:New York, United States
Cuprins
Preface; Part I. Ion Beam Nanofab: Tools, Techniques, and Applications: 1. Cluster ion beam process for nanofabrication; 2. Recent advances in FIB technology for nano-prototyping and nano-characterization; 3. Spatially resolved characterization of plastic deformation induced by focused-ion beam processing in structured InGaN/GaN layers; 4. Dynamics of ion beam stimulated surface mass transport to nanopores; 5. Ion beam lithography for nano-scale pattern features; 6. Ion-beam assist nano-texturing of films; 7. Swift heavy ion beam-based nanopatterning using self-assembled masks; 8. High-aspect-ratio micromachining of fluoropolymers using focused ion beam; 9. Resolution performance of programmable proximity aperture MeV ion beam lithography system; Part II. Patterning, Quantum Dot Synthesis, and Self Assembly: 10. Patterned adhesion of cells; 11. Nano-film and coating54l for biomedical application prepared by plasma-based technologies; 12. Modification of surface morphology of UHMWPE for biomedical implants; 13. Ion beam-induced quantum dot synthesis in glass; 14. Controlled growth of conducting carbon nanowires by ion irradiation: electrical and field emission properties; 15. Core-satellite metallic nanoclusters in silica obtained by multiple ion beam processing; 16. Pulsed low-energy ion-beam induced nucleation and growth of GE nanocrystals on SiO2; 17. Time evolution of nano dots created on InP(111) surfaces by keV irradiation; Part III. Examples: Applications and Devices: 18. Ion bombardment improvement on thermoelectric properties of multilayered Bi2Te3/Sb2Te3 deposited by magnetron sputtering; 19. Nanoscale surface modification of ultrahigh molecular weight polyethylene (UHMWPE) samples with the w + c ion implantation; 20. Irradiation effects of methanol cluster ion beams on solid surfaces; 21. Nano- and micro-structural evolution of UHMWPE by ion beam; 22. MeV ion-beam bombardment effects on the thermoelectric figures of merit of Zn4Sb3 and ZrNiSn-based half-Heusler compounds; 23. In vitro apatite formation on polymer substrates irradiated by the simultaneous use of oxygen cluster and monomer ion beams; 24. Fabrication of nanoscale gold clusters by low energy ion irradiation; 25. Fluence dependence of thermoelectric properties induced y ion bombardment of Zn4Sb3 and CeFe2Co2Sb12 thin films; 26. Effect of implantation dose and annealing time on the formation of Si nanocrystals embedded in thermal oxide; 27. Properties of nono-layers of nanoclusters of Ag in SiO2 host produced by MeV Si ion bombardment; 28. Effects of MeV Si ion bombardments on the properties of nano-layers of SiO2/SiO2+Zn4Sb3; 29. High resolution XRD studies of ion beam irradiated InGaAs/InP multi quantum wells; 30. Focused ion beam fabrication of individual carbon nanotube devices; 31. MeV ion beam fabrication of nanopores; Author index; Subject index.
Descriere
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.