Particles on Surfaces 3: Detection, Adhesion, and Removal
Editat de K.L. Mittalen Limba Engleză Paperback – 18 iul 2013
Toate formatele și edițiile | Preț | Express |
---|---|---|
Paperback (1) | 914.50 lei 6-8 săpt. | |
Springer Us – 18 iul 2013 | 914.50 lei 6-8 săpt. | |
Hardback (1) | 921.92 lei 6-8 săpt. | |
Springer Us – 31 mar 1992 | 921.92 lei 6-8 săpt. |
Preț: 914.50 lei
Preț vechi: 1115.25 lei
-18% Nou
Puncte Express: 1372
Preț estimativ în valută:
175.02€ • 184.64$ • 145.86£
175.02€ • 184.64$ • 145.86£
Carte tipărită la comandă
Livrare economică 02-16 ianuarie 25
Preluare comenzi: 021 569.72.76
Specificații
ISBN-13: 9781489923691
ISBN-10: 1489923691
Pagini: 340
Ilustrații: VIII, 328 p.
Dimensiuni: 178 x 254 x 18 mm
Greutate: 0.59 kg
Ediția:1991
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
ISBN-10: 1489923691
Pagini: 340
Ilustrații: VIII, 328 p.
Dimensiuni: 178 x 254 x 18 mm
Greutate: 0.59 kg
Ediția:1991
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
Public țintă
ResearchCuprins
I. Particle-Surface Interactions, Adhesion and General Papers.- Relevance of Surface Energetics to Departiculation of Disk Drive Substrates.- Particle Adhesion to Surface Under Turbulent Flow Conditions.- Modelling Particle Accumulation on a Filter Surface.- Particles in ULSI Grade Chemicals and Their Adhesion to Silicon Surfaces.- Evaluation of Polymeric Materials Used in the Manufacture of Disk Handling Cassettes.- The Release of Particles During Spaceflight.- II. Particle detection, identification, analysis and characterization.- Statistical Aspects of Surface Particle Counting.- Light Scattering by Submicron Spherical Particles on Semiconductor Surfaces.- BRDF Measurements and Mie Scattering Analysis of Spherical Particles on Optical Surfaces.- Identification of Surface Contaminants Using Infrared Micro-profiling.- Analysis of Particles on Surfaces by Total Reflection X-ray Fluorescence Spectrometry.- Characterization of Surface Metal Particulate Contamination Using the Polysilicon Chemical Vapor Deposition Process.- Detection and Subsequent Reduction of Surface Particle Induced Defects on Silicon Wafers.- Isolation and Characterization of Particle Induced Defects from the Lithography Process Using an Electrical Defect Monitor.- III. Particle Reduction and Removal.- Reducing Uncertainties in Particle Adhesion and Removal Measurements.- Particulate and Defect Reduction Strategies for Semiconductor Devices: Tools and Methodologies.- Ultrasonic Cleaning of Surfaces: An Overview.- Particle Protection of Semiconductor Surfaces by Reversible Wafer Bonding and Related Concepts.- Ultra-Clean Air Ionizers for Suppression of Particulate Surface Contamination.- The Cold Jet Process — An Environmentally Sound Alternative for Particles Removal From Advanced Substrates.-Identification and Removal of Storage Induced Particle Contamination on Silicon Wafer Surfaces.- Particle Removal from Oxide, Nitride, and Bare Silicon Surfaces Using Direct-Displacement Isopropyl Alcohol (IPA) Drying.- Elimination of Fretting Wear Particles from the Surface of a Power Cable on a Disk Drive Actuator: A Case Study.- Scanning UV Laser Removal of Contaminants from Semiconductor and Optical Surfaces.- About the Contributors.