Particles in Gases and Liquids 1: Detection, Characterization, and Control
Editat de K.L. Mittalen Limba Engleză Paperback – 26 sep 2011
Preț: 385.22 lei
Nou
Puncte Express: 578
Preț estimativ în valută:
73.75€ • 76.66$ • 61.14£
73.75€ • 76.66$ • 61.14£
Carte tipărită la comandă
Livrare economică 07-21 februarie 25
Preluare comenzi: 021 569.72.76
Specificații
ISBN-13: 9781461280859
ISBN-10: 1461280850
Pagini: 316
Ilustrații: 312 p.
Dimensiuni: 170 x 244 x 17 mm
Greutate: 0.5 kg
Ediția:Softcover reprint of the original 1st ed. 1989
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
ISBN-10: 1461280850
Pagini: 316
Ilustrații: 312 p.
Dimensiuni: 170 x 244 x 17 mm
Greutate: 0.5 kg
Ediția:Softcover reprint of the original 1st ed. 1989
Editura: Springer Us
Colecția Springer
Locul publicării:New York, NY, United States
Public țintă
ResearchCuprins
Monitoring Contaminant Particles in Gases and Liquids: A Review.- Measuring and Identifying Particles in Ultrapure Water.- Non-Poisson Models of Particle Counting.- Liquid Particle Counter Comparison.- Particle Counting of Liquid Systems using a Scanning Electron Microscope.- Improved Methodology for Measurement of Particle Concentrations in Semiconductor Process Chemicals.- Calibration of the Photo-sedimentometer LUMOSED with a Powder of Known Particle Size Distribution.- Particle Contamination Control and Measurement in Ultra-pure VLSI Grade Inert Gases.- Design and Practical Considerations in Using Cascade Impactors to Collect Particle Samples from Process Gases for Identification.- In-situ Monitoring of Particulate Contamination in Integrated Circuit Process Equipment.- A Real-time Fallout Monitor for 5–250 Micrometer Particles.- Measurement and Control of Particle-Bearing Air Currents in a Vertical Laminar Flow Clean Room.- Particle Deposition Velocity Studies in Silicon Technology.- Influence of Particle Charge on the Collection Efficiency of Electrified Filter Mats.- Particle Retention and Downstream Cleanliness of Point-of-use Filters for Semiconductor Process Gases.- A Fluid Dynamic Study of a Microcontaminant Particles Removal Process.- Particle Removal from Semiconductor Wafers using Cleaning Solvents.- Particle Contributions of Three Types of Cleanroom Jumpsuits.- Particle Generation in Devices used in Clean Manufacturing.- About the Contributors.