Plasma Processing of Semiconductors (NATO Science Series E:) de P.F. Williams

Plasma Processing of Semiconductors: NATO Science Series E:, cartea 336

P.F. Williams

en Limba Engleză Paperback – 12 oct 2012

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

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	Preț	Express
Paperback (1)	1831^.42 lei 6-8 săpt.
SPRINGER NETHERLANDS – 12 oct 2012	1831^.42 lei 6-8 săpt.
Hardback (1)	1838^.87 lei 6-8 săpt.
SPRINGER NETHERLANDS – 31 mai 1997	1838^.87 lei 6-8 săpt.

Preț

Express

Paperback (1)

1831^.42 lei 6-8 săpt.

SPRINGER NETHERLANDS – 12 oct 2012

1831^.42 lei 6-8 săpt.

Hardback (1)

1838^.87 lei 6-8 săpt.

SPRINGER NETHERLANDS – 31 mai 1997

1838^.87 lei 6-8 săpt.

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Cuprins

Plasma Etching.- to Plasma Etching.- Plasma Chemistry, Basic Processes and PECVD.- The Role of Ions in Reactive Ion Etching with Low Density Plasmas.- SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas.- Plasma Deposition.- to Plasma Enhanced Chemical Vapor Deposition.- Topography Evolution During Semiconductor Processing.- Deposition of Amorphous Silicon.- Plasma Sources.- High Density Sources for Plasma Etching.- Resonant Plasma Excitation by Electron Cyclotron Waves—Fundamentals and Applications.- The Transition from Capacitive to Inductive to Wave Sustained Discharges.- Physics of Surface-Wave Discharges.- Plasma-Surface Interactions.- Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas.- Plasma-Surface Interactions.- Cl2 Plasma-Si Surface Interactions in Plasma Etching.- Numerical Modeling.- Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing.- Fluid and Hybrid Models of Non Equilibrium Discharges.- Plasma Diagnostics.- Optical Diagnostics of Processing Plasmas.- Optical Diagnostics of Plasmas: A Tool for Process Control.- Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas.- Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials.- Mass Spectrometry of Reactive Plasmas.- Less Conventional Processing Applications of Plasmas.- Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications.- Remote Plasma Processing.- Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer.- Dusty Plasmas: Fundamental Aspects and Industrial Applications.- Industrial Application of Plasmas for Processing.- Low Energy Plasma Beams for Semiconductor Technology.- Process Control Concepts.- Issuesand Solutions for Applying Process Control to Semiconductor Manufacturing.