Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide: Springer Series in Surface Sciences, cartea 49
Autor Siegfried Hofmannen Limba Engleză Paperback – 9 noi 2014
Toate formatele și edițiile | Preț | Express |
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Paperback (1) | 1796.89 lei 6-8 săpt. | |
Springer Berlin, Heidelberg – 9 noi 2014 | 1796.89 lei 6-8 săpt. | |
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Springer Berlin, Heidelberg – 25 oct 2012 | 1801.41 lei 6-8 săpt. |
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Specificații
ISBN-13: 9783642431739
ISBN-10: 3642431739
Pagini: 548
Ilustrații: XX, 528 p.
Dimensiuni: 155 x 235 x 29 mm
Greutate: 0.76 kg
Ediția:2013
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Series in Surface Sciences
Locul publicării:Berlin, Heidelberg, Germany
ISBN-10: 3642431739
Pagini: 548
Ilustrații: XX, 528 p.
Dimensiuni: 155 x 235 x 29 mm
Greutate: 0.76 kg
Ediția:2013
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Series in Surface Sciences
Locul publicării:Berlin, Heidelberg, Germany
Public țintă
ResearchCuprins
Outline of the Technique/Brief Description.- Theoretical Background.- Instrumentation.- Practical Surface Analysis with AES.- Data Evaluation/Quantification.- Problem Solving with AES (Examples).
Textul de pe ultima copertă
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Caracteristici
This is the most comprehensive book available on this widely used analytical technique Includes supplementary material: sn.pub/extras