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Ion Implantation Techniques: Lectures given at the Ion Implantation School in Connection with Fourth International Conference on Ion Implantation: Equipment and Techniques Berchtesgaden, Fed. Rep. of Germany, September 13–15, 1982: Springer Series in Electronics and Photonics, cartea 10

Editat de H. Ryssel, H. Glawischnig
en Limba Engleză Paperback – 7 dec 2011

Din seria Springer Series in Electronics and Photonics

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Specificații

ISBN-13: 9783642687815
ISBN-10: 3642687814
Pagini: 392
Ilustrații: XII, 374 p.
Dimensiuni: 152 x 229 x 21 mm
Greutate: 0.52 kg
Ediția:Softcover reprint of the original 1st ed. 1982
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Springer Series in Electronics and Photonics

Locul publicării:Berlin, Heidelberg, Germany

Public țintă

Research

Cuprins

I Machine Aspects of Ion Implantation.- Ion Implantation System Concepts.- Ion Sources.- Faraday Cup Designs for Ion Implantation.- Safety and Ion Implanters.- II Ion Ranges in Solids.- The Stopping and Range of Ions in Solids.- The Calculation of Ion Ranges in Solids with Analytic Solutions.- Range Distributions.- III Measuring Techniques and Annealing.- Electrical Measuring Techniques.- Wafer Mapping Techniques for Characterization of Ion Implantation Processing.- Non-Electrical Measuring Techniques.- Annealing and Residual Damage.- IV Appendix: Modern Ion Implantation Equipment TM.- Evolution and Performance of the Nova NV-10 Predep™ Implanter.- Ion Implantation Equipment from Veeco.- The Series III A and IIIX Ion Implanters.- Standard High-Voltage Power Supplies for Ion Implantation.- The IONMICROPROBE A-DIDA 3000-30 for Dopant Depth Profiling and Impurity Bulk Analysis.- List of Contributors.