Modelling of Microfabrication Systems: Microtechnology and MEMS
Autor Raja Nassar, Weizhong Daien Limba Engleză Hardback – 13 iun 2003
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Specificații
ISBN-13: 9783540002529
ISBN-10: 3540002529
Pagini: 280
Ilustrații: X, 270 p.
Dimensiuni: 155 x 235 x 21 mm
Greutate: 0.56 kg
Ediția:2003
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Microtechnology and MEMS
Locul publicării:Berlin, Heidelberg, Germany
ISBN-10: 3540002529
Pagini: 280
Ilustrații: X, 270 p.
Dimensiuni: 155 x 235 x 21 mm
Greutate: 0.56 kg
Ediția:2003
Editura: Springer Berlin, Heidelberg
Colecția Springer
Seria Microtechnology and MEMS
Locul publicării:Berlin, Heidelberg, Germany
Public țintă
ResearchCuprins
1 Ion Beam.- 2 X-ray Lithography.- 3 Laser Chemical Vapor Deposition.- 4 Laser Photopolymerization.- 5 Laser Ablation.- 6 Thin Films.- References.
Recenzii
From the reviews:
"This book is aimed at people working on simulation and optimization process fabrication of Microelectromechanical Systems (MEMS). … the book provides a fairly complete view of the modeling of microfabrication processes. … ‘It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications’." (Grégory Guisbiers, Physicalia, Vol. 26 (1), 2004)
"This book is aimed at people working on simulation and optimization process fabrication of Microelectromechanical Systems (MEMS). … the book provides a fairly complete view of the modeling of microfabrication processes. … ‘It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications’." (Grégory Guisbiers, Physicalia, Vol. 26 (1), 2004)
Textul de pe ultima copertă
This book addresses modeling of systems that are important to the fabrication of three-dimensional microstructures. Selected topics are ion beam micromachining, x-ray lithography, laser chemical vapor deposition, photopolymerization, laser ablation, and thin films. Models simulating the behavior of these systems are presented, graphically illusratted, and discussed in the light of experimental results. Knowledge gained from such models is essential for system operation and optimization. This book is unique in that it focuses on high aspect ratio microtechnology. It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications.
Caracteristici
First book on modelling of the processing techniques for microsystems Focusses on the fabrication of high-aspect ratio microparts, namely ion beam micromachining, x-ray lithography, laser chemical vapor deposition, laser photopolimerization, laser ablation Includes supplementary material: sn.pub/extras