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Advances in Imaging and Electron Physics: Advances in Imaging and Electron Physics, cartea 209

Peter W. Hawkes, Martin Hÿtch
en Limba Engleză Hardback – 20 feb 2019
Advances in Imaging and Electron Physics, Volume 209, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.


  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing
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Specificații

ISBN-13: 9780128171776
ISBN-10: 0128171774
Pagini: 362
Dimensiuni: 152 x 229 mm
Greutate: 0.65 kg
Editura: ELSEVIER SCIENCE
Seria Advances in Imaging and Electron Physics


Cuprins

1. Introduction to EELS
Alberto Eljarrat Ascunce
2. Low-loss EELS methods
Alberto Eljarrat Ascunce
3. DFT modeling of wurtzite III-nitride ternary alloys
Alberto Eljarrat Ascunce
4. AlN/GaN and InAlN/GaN DBRs
Alberto Eljarrat Ascunce
5. Multiple InGaN QW heterostructure
Alberto Eljarrat Ascunce
6. Er-doped Si-nc/SiO2 multilayer
Alberto Eljarrat Ascunce
7. Si-NCs embedded in dielectric matrices
Alberto Eljarrat Ascunce
8. EELS Conclusions
Alberto Eljarrat Ascunce
9. High-Tc Superconductors and Magnetic Electron Lenses
Jan-Peter Adriaanse